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Title: One-step synthesis and patterning of aligned polymer nanowires on a substrate

Abstract

In a method of making a polymer structure on a substrate a layer of a first polymer, having a horizontal top surface, is applied to a surface of the substrate. An area of the top surface of the polymer is manipulated to create an uneven feature that is plasma etched to remove a first portion from the layer of the first polymer thereby leaving the polymer structure extending therefrom. A light emitting structure includes a conductive substrate from which an elongated nanostructure of a first polymer extends. A second polymer coating is disposed about the nanostructure and includes a second polymer, which includes a material such that a band gap exists between the second polymer coating and the elongated nanostructure. A conductive material coats the second polymer coating. The light emitting structure emits light when a voltage is applied between the conductive substrate and the conductive coating.

Inventors:
 [1];  [2];  [2];  [3]
  1. Marietta, GA
  2. Atlanta, GA
  3. Danbury, CT
Issue Date:
Research Org.:
Georgia Institute of Technology, Atlanta, GA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1033607
Patent Number(s):
8053376
Application Number:
12/492,333
Assignee:
Georgia Tech Research Corporation (Atlanta, GA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
DOE Contract Number:  
FG02-07ER46394
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Wang, Zhong L, Wang, Xudong, Morber, Jenny R, and Liu, Jin. One-step synthesis and patterning of aligned polymer nanowires on a substrate. United States: N. p., 2011. Web.
Wang, Zhong L, Wang, Xudong, Morber, Jenny R, & Liu, Jin. One-step synthesis and patterning of aligned polymer nanowires on a substrate. United States.
Wang, Zhong L, Wang, Xudong, Morber, Jenny R, and Liu, Jin. Tue . "One-step synthesis and patterning of aligned polymer nanowires on a substrate". United States. https://www.osti.gov/servlets/purl/1033607.
@article{osti_1033607,
title = {One-step synthesis and patterning of aligned polymer nanowires on a substrate},
author = {Wang, Zhong L and Wang, Xudong and Morber, Jenny R and Liu, Jin},
abstractNote = {In a method of making a polymer structure on a substrate a layer of a first polymer, having a horizontal top surface, is applied to a surface of the substrate. An area of the top surface of the polymer is manipulated to create an uneven feature that is plasma etched to remove a first portion from the layer of the first polymer thereby leaving the polymer structure extending therefrom. A light emitting structure includes a conductive substrate from which an elongated nanostructure of a first polymer extends. A second polymer coating is disposed about the nanostructure and includes a second polymer, which includes a material such that a band gap exists between the second polymer coating and the elongated nanostructure. A conductive material coats the second polymer coating. The light emitting structure emits light when a voltage is applied between the conductive substrate and the conductive coating.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 08 00:00:00 EST 2011},
month = {Tue Nov 08 00:00:00 EST 2011}
}