Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light

Menoni, Carmen S; Rocca, Jorge J; Vaschenko, Georgiy; Bloom, Scott; Anderson, Erik H; Chao, Weilun; Hemberg, Oscar

Title: Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light

Abstract

Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

Inventors:

Menoni, Carmen S ^[1]; Rocca, Jorge J ^[1]; Vaschenko, Georgiy ^[2]; Bloom, Scott ^[3]; Anderson, Erik H ^[4]; Chao, Weilun ^[4]; Hemberg, Oscar ^[5]

Fort Collins, CO
San Diego, CA
Encinitas, CA
El Cerrito, CA
Stockholm, SE

Issue Date:: 2011-04-26

Research Org.:: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1016677

Patent Number(s):: 7931850

Application Number:: US Patent Application 12/861,627

Assignee:: Colorado State University Research Foundation (Fort Collins, CO); The Regents of University of California (Oakland, CA); JMAR Technologies, Inc. (San Diego, CA)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B23 - MACHINE TOOLS B23K - SOLDERING OR UNSOLDERING

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B - PERFORMING OPERATIONS B23 - MACHINE TOOLS B23K - SOLDERING OR UNSOLDERING
B23K26/0624 - {using ultrashort pulses, i.e. pulses of 1ns or less}
B23K26/123 - {in an atmosphere of particular gases}
B23K2103/50 - {Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26}
B23K26/40 - taking account of the properties of the material involved
B23K26/0665 - {by beam condensation on the workpiece, e.g. for focusing}
B23K26/032 - {using optical means}
B23K26/389 - {of fluid openings, e.g. nozzles, jets
B23K26/127 - {in an enclosure}
B23K26/066 - by using masks
B23K26/1224 - {in vacuum}
B23K26/12 - in a special atmosphere, e.g. in an enclosure

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DOE Contract Number:: AC02-05CH11231

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 42 ENGINEERING

Citation Formats


                    Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, and Hemberg, Oscar. Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light.  United States: N. p., 2011. 
        Web.

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                    Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, & Hemberg, Oscar. Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light.  United States.

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                    Menoni, Carmen S, Rocca, Jorge J, Vaschenko, Georgiy, Bloom, Scott, Anderson, Erik H, Chao, Weilun, and Hemberg, Oscar. Tue .  
        "Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light".  United States.  https://www.osti.gov/servlets/purl/1016677.

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@article{osti_1016677,

  title        = {Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light},

  author       = {Menoni, Carmen S and Rocca, Jorge J and Vaschenko, Georgiy and Bloom, Scott and Anderson, Erik H and Chao, Weilun and Hemberg, Oscar},

  abstractNote = {Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2011},

  month        = {4}

}

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Works referenced in this record:

Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser
journal, February 2001

Liu, Y.; Seminario, M.; Tomasel, F. G.
Physical Review A, Vol. 63, Issue 3
https://doi.org/10.1103/PhysRevA.63.033802

X-ray nanoplasma instruments and tools
conference, May 2005

Bloom, S. H.; Rieger, H.; Alwan, J.
Microlithography 2005, SPIE Proceedings
https://doi.org/10.1117/12.597119

Nanometer focusing of hard x rays by phase zone plates
journal, May 1999

Yun, W.; Lai, B.; Cai, Z.
Review of Scientific Instruments, Vol. 70, Issue 5
https://doi.org/10.1063/1.1149744

Ablation of PMMA, PTFE, and Si by soft x-rays emitted from hot dense plasma
conference, September 2002

Juha, Libor; Krasa, Josef; Praeg, A. R.
International Symposium on High-Power Laser Ablation 2002, SPIE Proceedings
https://doi.org/10.1117/12.482076

Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to $13.9 nm$ and gain down to $10.9 nm$
journal, November 2005

Wang, Y.; Larotonda, M. A.; Luther, B. M.
Physical Review A, Vol. 72, Issue 5
https://doi.org/10.1103/PhysRevA.72.053807

Applications of high-repetition-rate tabletop soft x-ray laser: laser ablation with a focused beam and reflectometry of materials
conference, October 1999

Benware, Brady R.; Rocca, Jorge J. G.; Ozols, A.
SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, SPIE Proceedings
https://doi.org/10.1117/12.366670

Continuous high-repetition-rate operation of collisional soft-x-ray lasers with solid targets
journal, January 2006

Weith, A.; Larotonda, M. A.; Wang, Y.
Optics Letters, Vol. 31, Issue 13
https://doi.org/10.1364/OL.31.001994

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Similar Records

Title: Nanometer-scale ablation using focused, coherent extreme ultraviolet/soft x-ray light

Abstract

Citation Formats

Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser journal, February 2001

X-ray nanoplasma instruments and tools conference, May 2005

Nanometer focusing of hard x rays by phase zone plates journal, May 1999

Ablation of PMMA, PTFE, and Si by soft x-rays emitted from hot dense plasma conference, September 2002

Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9 nm and gain down to 10.9 nm journal, November 2005

Applications of high-repetition-rate tabletop soft x-ray laser: laser ablation with a focused beam and reflectometry of materials conference, October 1999

Continuous high-repetition-rate operation of collisional soft-x-ray lasers with solid targets journal, January 2006

Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser
journal, February 2001

X-ray nanoplasma instruments and tools
conference, May 2005

Nanometer focusing of hard x rays by phase zone plates
journal, May 1999

Ablation of PMMA, PTFE, and Si by soft x-rays emitted from hot dense plasma
conference, September 2002

Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to $13.9 nm$ and gain down to $10.9 nm$
journal, November 2005

Applications of high-repetition-rate tabletop soft x-ray laser: laser ablation with a focused beam and reflectometry of materials
conference, October 1999

Continuous high-repetition-rate operation of collisional soft-x-ray lasers with solid targets
journal, January 2006