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Title: Method to fabricate a tilted logpile photonic crystal

Abstract

A method to fabricate a tilted logpile photonic crystal requires only two lithographic exposures and does not require mask repositioning between exposures. The mask and photoresist-coated substrate are spaced a fixed and constant distance apart using a spacer and the stack is clamped together. The stack is then tilted at a crystallographic symmetry angle (e.g., 45 degrees) relative to the X-ray beam and rotated about the surface normal until the mask is aligned with the X-ray beam. The stack is then rotated in plane by a small stitching angle and exposed to the X-ray beam to pattern the first half of the structure. The stack is then rotated by 180.degree. about the normal and a second exposure patterns the remaining half of the structure. The method can use commercially available DXRL scanner technology and LIGA processes to fabricate large-area, high-quality tilted logpile photonic crystals.

Inventors:
 [1];  [1]
  1. Albuquerque, NM
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1016015
Patent Number(s):
7820365
Application Number:
11/779,605
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Williams, John D, and Sweatt, William C. Method to fabricate a tilted logpile photonic crystal. United States: N. p., 2010. Web.
Williams, John D, & Sweatt, William C. Method to fabricate a tilted logpile photonic crystal. United States.
Williams, John D, and Sweatt, William C. Tue . "Method to fabricate a tilted logpile photonic crystal". United States. https://www.osti.gov/servlets/purl/1016015.
@article{osti_1016015,
title = {Method to fabricate a tilted logpile photonic crystal},
author = {Williams, John D and Sweatt, William C},
abstractNote = {A method to fabricate a tilted logpile photonic crystal requires only two lithographic exposures and does not require mask repositioning between exposures. The mask and photoresist-coated substrate are spaced a fixed and constant distance apart using a spacer and the stack is clamped together. The stack is then tilted at a crystallographic symmetry angle (e.g., 45 degrees) relative to the X-ray beam and rotated about the surface normal until the mask is aligned with the X-ray beam. The stack is then rotated in plane by a small stitching angle and exposed to the X-ray beam to pattern the first half of the structure. The stack is then rotated by 180.degree. about the normal and a second exposure patterns the remaining half of the structure. The method can use commercially available DXRL scanner technology and LIGA processes to fabricate large-area, high-quality tilted logpile photonic crystals.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {10}
}

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Works referenced in this record:

Photonic band-gap microcavities in three dimensions
journal, June 1999


Photonic band gaps in three dimensions: New layer-by-layer periodic structures
journal, February 1994


Photonic band structure: The face-centered-cubic case
journal, October 1989


Tilted logpile photonic crystals using the LIGA technique
conference, September 2006


Photonic Band Gaps Based on Tetragonal Lattices of Slanted Pores
journal, June 2003


X-ray and electron-beam lithography of three-dimensional array structures for photonics
journal, January 2003

  • Romanato, F.; Cojoc, D.; Di Fabrizio, E.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6
  • https://doi.org/10.1116/1.1629295

A three-dimensional photonic crystal operating at infrared wavelengths
journal, July 1998


Fabrication of 3D metallic photonic crystals by X-ray lithography
journal, June 2003


Fabrication of photonic crystals by deep x-ray lithography
journal, September 1997


Submicron resolution of secondary radiation in LIGA polymethyl-methacrylate resist exposure
journal, July 2004


Direct laser writing and characterization of “Slanted Pore” Photonic Crystals
journal, September 2004


Extended performance infrared directional reflectometer for the measurement of total, diffuse, and specular reflectance
conference, October 1994

  • Neu, John T.; Beecroft, Michael T.; Schramm, Ronald
  • SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, SPIE Proceedings
  • https://doi.org/10.1117/12.189204

Photonic Band Calculations for Woodpile Structures
journal, February 1994


Photonic band-gap structures
journal, January 1993


Slanted-pore photonic band-gap materials
journal, March 2005