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Title: Fabrication of thermal microphotonic sensors and sensor arrays

Abstract

A thermal microphotonic sensor is fabricated on a silicon substrate by etching an opening and a trench into the substrate, and then filling in the opening and trench with silicon oxide which can be deposited or formed by thermally oxidizing a portion of the silicon substrate surrounding the opening and trench. The silicon oxide forms a support post for an optical resonator which is subsequently formed from a layer of silicon nitride, and also forms a base for an optical waveguide formed from the silicon nitride layer. Part of the silicon substrate can be selectively etched away to elevate the waveguide and resonator. The thermal microphotonic sensor, which is useful to detect infrared radiation via a change in the evanescent coupling of light between the waveguide and resonator, can be formed as a single device or as an array.

Inventors:
 [1];  [2];  [2]
  1. Tijeras, NM
  2. Albuquerque, NM
Issue Date:
Research Org.:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1015989
Patent Number(s):
7820970
Application Number:
12/491,596
Assignee:
Sandia Corporation (Albuquerque, NM)
Patent Classifications (CPCs):
G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Shaw, Michael J, Watts, Michael R, and Nielson, Gregory N. Fabrication of thermal microphotonic sensors and sensor arrays. United States: N. p., 2010. Web.
Shaw, Michael J, Watts, Michael R, & Nielson, Gregory N. Fabrication of thermal microphotonic sensors and sensor arrays. United States.
Shaw, Michael J, Watts, Michael R, and Nielson, Gregory N. Tue . "Fabrication of thermal microphotonic sensors and sensor arrays". United States. https://www.osti.gov/servlets/purl/1015989.
@article{osti_1015989,
title = {Fabrication of thermal microphotonic sensors and sensor arrays},
author = {Shaw, Michael J and Watts, Michael R and Nielson, Gregory N},
abstractNote = {A thermal microphotonic sensor is fabricated on a silicon substrate by etching an opening and a trench into the substrate, and then filling in the opening and trench with silicon oxide which can be deposited or formed by thermally oxidizing a portion of the silicon substrate surrounding the opening and trench. The silicon oxide forms a support post for an optical resonator which is subsequently formed from a layer of silicon nitride, and also forms a base for an optical waveguide formed from the silicon nitride layer. Part of the silicon substrate can be selectively etched away to elevate the waveguide and resonator. The thermal microphotonic sensor, which is useful to detect infrared radiation via a change in the evanescent coupling of light between the waveguide and resonator, can be formed as a single device or as an array.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {10}
}

Works referenced in this record:

Evaluation of thermal parameters of bolometer devices
journal, March 2002


Ultra-high-Q toroid microcavity on a chip
journal, February 2003


Micromachined bolometer with single-crystal silicon diode as temperature sensor
journal, May 2005


Fabrication techniques for low-loss silicon nitride waveguides
conference, January 2005


Uncooled IR imaging array based on quartz microresonators
journal, June 1996


Performance of 320 x 240 uncooled IRFPA with SOI diode detectors
conference, December 2000


High-Q microring resonator for biochemical sensors
conference, March 2005