Fabrication of thermal microphotonic sensors and sensor arrays

Title: Fabrication of thermal microphotonic sensors and sensor arrays

Abstract

A thermal microphotonic sensor is fabricated on a silicon substrate by etching an opening and a trench into the substrate, and then filling in the opening and trench with silicon oxide which can be deposited or formed by thermally oxidizing a portion of the silicon substrate surrounding the opening and trench. The silicon oxide forms a support post for an optical resonator which is subsequently formed from a layer of silicon nitride, and also forms a base for an optical waveguide formed from the silicon nitride layer. Part of the silicon substrate can be selectively etched away to elevate the waveguide and resonator. The thermal microphotonic sensor, which is useful to detect infrared radiation via a change in the evanescent coupling of light between the waveguide and resonator, can be formed as a single device or as an array.

Inventors:

Shaw, Michael J ^[1]; Watts, Michael R ^[2]; Nielson, Gregory N ^[2]

Tijeras, NM
Albuquerque, NM

Issue Date:: 2010-10-26

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 1015989

Patent Number(s):: 7820970

Application Number:: 12/491,596

Assignee:: Sandia Corporation (Albuquerque, NM)

Patent Classifications (CPCs):: G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT

G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES

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G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
G01J5/08 - Optical features {
G01J5/44 - using change of resonant frequency, e.g. of piezo-electric crystal

G - PHYSICS G01 - MEASURING G01N - INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
G01N21/7746 - {the waveguide coupled to a cavity resonator}

G - PHYSICS G01 - MEASURING G01J - MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED, VISIBLE OR ULTRA-VIOLET LIGHT
G01J5/0821 - {using optical fibers}

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DOE Contract Number:: AC04-94AL85000

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Citation Formats


                    Shaw, Michael J, Watts, Michael R, and Nielson, Gregory N. Fabrication of thermal microphotonic sensors and sensor arrays.  United States: N. p., 2010. 
        Web.

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                    Shaw, Michael J, Watts, Michael R, & Nielson, Gregory N. Fabrication of thermal microphotonic sensors and sensor arrays.  United States.

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                    Shaw, Michael J, Watts, Michael R, and Nielson, Gregory N. Tue .  
        "Fabrication of thermal microphotonic sensors and sensor arrays".  United States.  https://www.osti.gov/servlets/purl/1015989.

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@article{osti_1015989,

  title        = {Fabrication of thermal microphotonic sensors and sensor arrays},

  author       = {Shaw, Michael J and Watts, Michael R and Nielson, Gregory N},

  abstractNote = {A thermal microphotonic sensor is fabricated on a silicon substrate by etching an opening and a trench into the substrate, and then filling in the opening and trench with silicon oxide which can be deposited or formed by thermally oxidizing a portion of the silicon substrate surrounding the opening and trench. The silicon oxide forms a support post for an optical resonator which is subsequently formed from a layer of silicon nitride, and also forms a base for an optical waveguide formed from the silicon nitride layer. Part of the silicon substrate can be selectively etched away to elevate the waveguide and resonator. The thermal microphotonic sensor, which is useful to detect infrared radiation via a change in the evanescent coupling of light between the waveguide and resonator, can be formed as a single device or as an array.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2010},

  month        = {10}

}

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Works referenced in this record:

Evaluation of thermal parameters of bolometer devices
journal, March 2002

Neuzil, P.; Mei, T.
Applied Physics Letters, Vol. 80, Issue 10
https://doi.org/10.1063/1.1458686

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Armani, D. K.; Kippenberg, T. J.; Spillane, S. M.
Nature, Vol. 421, Issue 6926, p. 925-928
https://doi.org/10.1038/nature01371

Fabrication techniques for low-loss silicon nitride waveguides
conference, January 2005

Shaw, Michael J.; Guo, Junpeng; Vawter, Gregory A.
MOEMS-MEMS Micro & Nanofabrication, SPIE Proceedings
https://doi.org/10.1117/12.588828

Uncooled IR imaging array based on quartz microresonators
journal, June 1996

Vig, J. R.; Filler, R. L.; Kim, Y.
Journal of Microelectromechanical Systems, Vol. 5, Issue 2
https://doi.org/10.1109/84.506201

Performance of 320 x 240 uncooled IRFPA with SOI diode detectors
conference, December 2000

Ishikawa, Tomohiro; Ueno, Masashi; Nakaki, Yoshiyuki
International Symposium on Optical Science and Technology, SPIE Proceedings
https://doi.org/10.1117/12.409857

High-Q microring resonator for biochemical sensors
conference, March 2005

Guo, Junpeng; Shaw, Michael J.; Vawter, G. A.
Integrated Optoelectronic Devices 2005, SPIE Proceedings
https://doi.org/10.1117/12.589467

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Title: Fabrication of thermal microphotonic sensors and sensor arrays

Abstract

Citation Formats

Evaluation of thermal parameters of bolometer devices journal, March 2002

Ultra-high-Q toroid microcavity on a chip journal, February 2003

Fabrication techniques for low-loss silicon nitride waveguides conference, January 2005

Uncooled IR imaging array based on quartz microresonators journal, June 1996

Performance of 320 x 240 uncooled IRFPA with SOI diode detectors conference, December 2000

High-Q microring resonator for biochemical sensors conference, March 2005

Evaluation of thermal parameters of bolometer devices
journal, March 2002

Ultra-high-Q toroid microcavity on a chip
journal, February 2003

Fabrication techniques for low-loss silicon nitride waveguides
conference, January 2005

Uncooled IR imaging array based on quartz microresonators
journal, June 1996

Performance of 320 x 240 uncooled IRFPA with SOI diode detectors
conference, December 2000

High-Q microring resonator for biochemical sensors
conference, March 2005