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Title: Internal gettering by metal alloy clusters

Abstract

The present invention relates to the internal gettering of impurities in semiconductors by metal alloy clusters. In particular, intermetallic clusters are formed within silicon, such clusters containing two or more transition metal species. Such clusters have melting temperatures below that of the host material and are shown to be particularly effective in gettering impurities within the silicon and collecting them into isolated, less harmful locations. Novel compositions for some of the metal alloy clusters are also described.

Inventors:
 [1];  [2];  [3];  [2];  [2];  [4]
  1. San Diego, CA
  2. Berkeley, CA
  3. Albany, CA
  4. Piedmont, CA
Issue Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1015499
Patent Number(s):
7763095
Application Number:
11/447,223
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
Y - NEW / CROSS SECTIONAL TECHNOLOGIES Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE Y02E - REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Buonassisi, Anthony, Heuer, Matthias, Istratov, Andrei A, Pickett, Matthew D, Marcus, Mathew A, and Weber, Eicke R. Internal gettering by metal alloy clusters. United States: N. p., 2010. Web.
Buonassisi, Anthony, Heuer, Matthias, Istratov, Andrei A, Pickett, Matthew D, Marcus, Mathew A, & Weber, Eicke R. Internal gettering by metal alloy clusters. United States.
Buonassisi, Anthony, Heuer, Matthias, Istratov, Andrei A, Pickett, Matthew D, Marcus, Mathew A, and Weber, Eicke R. Tue . "Internal gettering by metal alloy clusters". United States. https://www.osti.gov/servlets/purl/1015499.
@article{osti_1015499,
title = {Internal gettering by metal alloy clusters},
author = {Buonassisi, Anthony and Heuer, Matthias and Istratov, Andrei A and Pickett, Matthew D and Marcus, Mathew A and Weber, Eicke R},
abstractNote = {The present invention relates to the internal gettering of impurities in semiconductors by metal alloy clusters. In particular, intermetallic clusters are formed within silicon, such clusters containing two or more transition metal species. Such clusters have melting temperatures below that of the host material and are shown to be particularly effective in gettering impurities within the silicon and collecting them into isolated, less harmful locations. Novel compositions for some of the metal alloy clusters are also described.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {7}
}

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Copper, lithium, and hydrogen passivation of boron in c -Si
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Transition metals in silicon
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