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Title: Figure correction of multilayer coated optics

Abstract

A process is provided for producing near-perfect optical surfaces, for EUV and soft-x-ray optics. The method involves polishing or otherwise figuring the multilayer coating that has been deposited on an optical substrate, in order to correct for errors in the figure of the substrate and coating. A method such as ion-beam milling is used to remove material from the multilayer coating by an amount that varies in a specified way across the substrate. The phase of the EUV light that is reflected from the multilayer will be affected by the amount of multilayer material removed, but this effect will be reduced by a factor of 1-n as compared with height variations of the substrate, where n is the average refractive index of the multilayer.

Inventors:
 [1];  [1]
  1. Livermore, CA
Issue Date:
Research Org.:
EUV LLC. (Santa Clara, CA)
Sponsoring Org.:
USDOE
OSTI Identifier:
1014367
Patent Number(s):
7662263
Application Number:
US Patent Application 10/256,317
Assignee:
EUV LLC. (Santa Clara, CA)
Patent Classifications (CPCs):
G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Chapman, Henry N., and Taylor, John S. Figure correction of multilayer coated optics. United States: N. p., 2010. Web.
Chapman, Henry N., & Taylor, John S. Figure correction of multilayer coated optics. United States.
Chapman, Henry N., and Taylor, John S. Tue . "Figure correction of multilayer coated optics". United States. https://www.osti.gov/servlets/purl/1014367.
@article{osti_1014367,
title = {Figure correction of multilayer coated optics},
author = {Chapman, Henry N. and Taylor, John S},
abstractNote = {A process is provided for producing near-perfect optical surfaces, for EUV and soft-x-ray optics. The method involves polishing or otherwise figuring the multilayer coating that has been deposited on an optical substrate, in order to correct for errors in the figure of the substrate and coating. A method such as ion-beam milling is used to remove material from the multilayer coating by an amount that varies in a specified way across the substrate. The phase of the EUV light that is reflected from the multilayer will be affected by the amount of multilayer material removed, but this effect will be reduced by a factor of 1-n as compared with height variations of the substrate, where n is the average refractive index of the multilayer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {2}
}

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Works referenced in this record:

Film-stress-induced deformation of EUV reflective optics
conference, June 1999