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Title: Decal transfer lithography

Abstract

A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.

Inventors:
 [1];  [1];  [1];  [2]
  1. Champaign, IL
  2. Savoy, IL
Issue Date:
Research Org.:
Univ. of Illinois at Urbana-Champaign, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1014365
Patent Number(s):
7662545
Application Number:
US Patent Application 10/965,279
Assignee:
The Board of Trustees of the University of Illinois (Urbana, IL)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
DOE Contract Number:  
FG02-91ER45439
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Nuzzo, Ralph G, Childs, William R, Motala, Michael J, and Lee, Keon Jae. Decal transfer lithography. United States: N. p., 2010. Web.
Nuzzo, Ralph G, Childs, William R, Motala, Michael J, & Lee, Keon Jae. Decal transfer lithography. United States.
Nuzzo, Ralph G, Childs, William R, Motala, Michael J, and Lee, Keon Jae. Tue . "Decal transfer lithography". United States. https://www.osti.gov/servlets/purl/1014365.
@article{osti_1014365,
title = {Decal transfer lithography},
author = {Nuzzo, Ralph G and Childs, William R and Motala, Michael J and Lee, Keon Jae},
abstractNote = {A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {2}
}

Works referenced in this record:

Ordering of Spontaneously Formed Buckles on Planar Surfaces
journal, April 2000


Lithographic Imaging Techniques for the Formation of Nanoscopic Features
journal, July 1999


Photolithographic Technique for Direct Photochemical Modification and Chemical Micropatterning of Surfaces
journal, March 2004


Decal Transfer Microlithography: A New Soft-Lithographic Patterning Method
journal, November 2002


Prototyping of Masks, Masters, and Stamps/Molds for Soft Lithography Using an Office Printer and Photographic Reduction
journal, July 2000


Using Patterns in Microfiche as Photomasks in 10-μm-Scale Microfabrication
journal, September 1999


Organic Materials Challenges for 193 nm Imaging
journal, August 1999


Patterning of Thin-Film Microstructures on Non-Planar Substrate Surfaces Using Decal Transfer Lithography
journal, August 2004


Conversion of Some Siloxane Polymers to Silicon Oxide by UV/Ozone Photochemical Processes
journal, June 2000


Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators
journal, July 2003


High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins/maleic anhydride
conference, June 2000


Soft Lithography
journal, August 1998


A printable form of silicon for high performance thin film transistors on plastic substrates
journal, June 2004