Decal transfer lithography
Abstract
A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.
- Inventors:
-
- Champaign, IL
- Savoy, IL
- Issue Date:
- Research Org.:
- Univ. of Illinois at Urbana-Champaign, IL (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1014365
- Patent Number(s):
- 7662545
- Application Number:
- US Patent Application 10/965,279
- Assignee:
- The Board of Trustees of the University of Illinois (Urbana, IL)
- Patent Classifications (CPCs):
-
B - PERFORMING OPERATIONS B81 - MICROSTRUCTURAL TECHNOLOGY B81C - PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
- DOE Contract Number:
- FG02-91ER45439
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Nuzzo, Ralph G, Childs, William R, Motala, Michael J, and Lee, Keon Jae. Decal transfer lithography. United States: N. p., 2010.
Web.
Nuzzo, Ralph G, Childs, William R, Motala, Michael J, & Lee, Keon Jae. Decal transfer lithography. United States.
Nuzzo, Ralph G, Childs, William R, Motala, Michael J, and Lee, Keon Jae. Tue .
"Decal transfer lithography". United States. https://www.osti.gov/servlets/purl/1014365.
@article{osti_1014365,
title = {Decal transfer lithography},
author = {Nuzzo, Ralph G and Childs, William R and Motala, Michael J and Lee, Keon Jae},
abstractNote = {A method of making a microstructure includes selectively activating a portion of a surface of a silicon-containing elastomer, contacting the activated portion with a substance, and bonding the activated portion and the substance, such that the activated portion of the surface and the substance in contact with the activated portion are irreversibly attached. The selective activation may be accomplished by positioning a mask on the surface of the silicon-containing elastomer, and irradiating the exposed portion with UV radiation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {2}
}
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