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Title: Charge-free method of forming nanostructures on a substrate

Abstract

A charge-free method of forming a nanostructure at low temperatures on a substrate. A substrate that is reactive with one of atomic oxygen and nitrogen is provided. A flux of neutral atoms of least one of oxygen and nitrogen is generated within a laser-sustained-discharge plasma source and a collimated beam of energetic neutral atoms and molecules is directed from the plasma source onto a surface of the substrate to form the nanostructure. The energetic neutral atoms and molecules in the beam have an average kinetic energy in a range from about 1 eV to about 5 eV.

Inventors:
;  [1];  [1]
  1. Los Alamos, NM
Issue Date:
Research Org.:
Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1012820
Patent Number(s):
7759229
Application Number:
11/603,516
Assignee:
Los Alamos National Security, LLC (Los Alamos, NM)
Patent Classifications (CPCs):
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
DOE Contract Number:  
AC52-06NA25396
Resource Type:
Patent
Country of Publication:
United States
Language:
English

Citation Formats

Hoffbauer,, Mark, Akhadov, and Elshan,. Charge-free method of forming nanostructures on a substrate. United States: N. p., 2010. Web.
Hoffbauer,, Mark, Akhadov, & Elshan,. Charge-free method of forming nanostructures on a substrate. United States.
Hoffbauer,, Mark, Akhadov, and Elshan,. Tue . "Charge-free method of forming nanostructures on a substrate". United States. https://www.osti.gov/servlets/purl/1012820.
@article{osti_1012820,
title = {Charge-free method of forming nanostructures on a substrate},
author = {Hoffbauer, and Mark, Akhadov and Elshan,},
abstractNote = {A charge-free method of forming a nanostructure at low temperatures on a substrate. A substrate that is reactive with one of atomic oxygen and nitrogen is provided. A flux of neutral atoms of least one of oxygen and nitrogen is generated within a laser-sustained-discharge plasma source and a collimated beam of energetic neutral atoms and molecules is directed from the plasma source onto a surface of the substrate to form the nanostructure. The energetic neutral atoms and molecules in the beam have an average kinetic energy in a range from about 1 eV to about 5 eV.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2010},
month = {7}
}

Patent:

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