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Title: Materials Data on U2SiO10 by Materials Project

Abstract

U2SiO10 crystallizes in the orthorhombic Fddd space group. The structure is three-dimensional. U is bonded to seven O atoms to form distorted UO7 pentagonal bipyramids that share corners with two equivalent SiO4 tetrahedra, edges with two equivalent UO7 pentagonal bipyramids, and an edgeedge with one SiO4 tetrahedra. There are a spread of U–O bond distances ranging from 1.83–2.47 Å. Si is bonded to four equivalent O atoms to form SiO4 tetrahedra that share corners with four equivalent UO7 pentagonal bipyramids and edges with two equivalent UO7 pentagonal bipyramids. All Si–O bond lengths are 1.64 Å. There are three inequivalent O sites. In the first O site, O is bonded in a 1-coordinate geometry to two equivalent U and one Si atom. In the second O site, O is bonded in a single-bond geometry to one U atom. In the third O site, O is bonded in a single-bond geometry to one U atom.

Publication Date:
Other Number(s):
mp-1192867
DOE Contract Number:  
AC02-05CH11231
Research Org.:
LBNL Materials Project; Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Collaborations:
The Materials Project; MIT; UC Berkeley; Duke; U Louvain
Subject:
36 MATERIALS SCIENCE; O-Si-U; U2SiO10; crystal structure
OSTI Identifier:
1700451
DOI:
https://doi.org/10.17188/1700451

Citation Formats

Materials Data on U2SiO10 by Materials Project. United States: N. p., 2020. Web. doi:10.17188/1700451.
Materials Data on U2SiO10 by Materials Project. United States. doi:https://doi.org/10.17188/1700451
2020. "Materials Data on U2SiO10 by Materials Project". United States. doi:https://doi.org/10.17188/1700451. https://www.osti.gov/servlets/purl/1700451. Pub date:Sun May 03 04:00:00 UTC 2020
@article{osti_1700451,
title = {Materials Data on U2SiO10 by Materials Project},
abstractNote = {U2SiO10 crystallizes in the orthorhombic Fddd space group. The structure is three-dimensional. U is bonded to seven O atoms to form distorted UO7 pentagonal bipyramids that share corners with two equivalent SiO4 tetrahedra, edges with two equivalent UO7 pentagonal bipyramids, and an edgeedge with one SiO4 tetrahedra. There are a spread of U–O bond distances ranging from 1.83–2.47 Å. Si is bonded to four equivalent O atoms to form SiO4 tetrahedra that share corners with four equivalent UO7 pentagonal bipyramids and edges with two equivalent UO7 pentagonal bipyramids. All Si–O bond lengths are 1.64 Å. There are three inequivalent O sites. In the first O site, O is bonded in a 1-coordinate geometry to two equivalent U and one Si atom. In the second O site, O is bonded in a single-bond geometry to one U atom. In the third O site, O is bonded in a single-bond geometry to one U atom.},
doi = {10.17188/1700451},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {5}
}