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Title: Materials Data on SiO2 by Materials Project

Abstract

SiO2 crystallizes in the orthorhombic Fddd space group. The structure is three-dimensional. Si4+ is bonded to four O2- atoms to form corner-sharing SiO4 tetrahedra. There are a spread of Si–O bond distances ranging from 1.59–1.67 Å. There are four inequivalent O2- sites. In the first O2- site, O2- is bonded in a bent 150 degrees geometry to two equivalent Si4+ atoms. In the second O2- site, O2- is bonded in a bent 150 degrees geometry to two equivalent Si4+ atoms. In the third O2- site, O2- is bonded in a bent 120 degrees geometry to two equivalent Si4+ atoms. In the fourth O2- site, O2- is bonded in a linear geometry to two equivalent Si4+ atoms.

Authors:
Contributors:
Researcher:
Publication Date:
Other Number(s):
mp-555544
DOE Contract Number:  
AC02-05CH11231; EDCBEE
Product Type:
Dataset
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). LBNL Materials Project
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Subject:
36 MATERIALS SCIENCE
Keywords:
crystal structure; SiO2; O-Si
OSTI Identifier:
1268867
DOI:
10.17188/1268867

Citation Formats

Persson, Kristin, and Project, Materials. Materials Data on SiO2 by Materials Project. United States: N. p., 2020. Web. doi:10.17188/1268867.
Persson, Kristin, & Project, Materials. Materials Data on SiO2 by Materials Project. United States. doi:10.17188/1268867.
Persson, Kristin, and Project, Materials. 2020. "Materials Data on SiO2 by Materials Project". United States. doi:10.17188/1268867. https://www.osti.gov/servlets/purl/1268867. Pub date:Wed Apr 29 00:00:00 EDT 2020
@article{osti_1268867,
title = {Materials Data on SiO2 by Materials Project},
author = {Persson, Kristin and Project, Materials},
abstractNote = {SiO2 crystallizes in the orthorhombic Fddd space group. The structure is three-dimensional. Si4+ is bonded to four O2- atoms to form corner-sharing SiO4 tetrahedra. There are a spread of Si–O bond distances ranging from 1.59–1.67 Å. There are four inequivalent O2- sites. In the first O2- site, O2- is bonded in a bent 150 degrees geometry to two equivalent Si4+ atoms. In the second O2- site, O2- is bonded in a bent 150 degrees geometry to two equivalent Si4+ atoms. In the third O2- site, O2- is bonded in a bent 120 degrees geometry to two equivalent Si4+ atoms. In the fourth O2- site, O2- is bonded in a linear geometry to two equivalent Si4+ atoms.},
doi = {10.17188/1268867},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2020},
month = {4}
}

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