Particle removal challenges with EUV patterned mask for the sub-22nm HP node

Rastegar, A; Eichenlaub, S; Kadaksham, A J; Lee, B; House, M; Huh, S; Cha, B; Yun, H; Mochi, I; Goldberg, K A

Title: Particle removal challenges with EUV patterned mask for the sub-22nm HP node

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Abstract

The particle removal efficiency (PRE) of cleaning processes diminishes whenever the minimum defect size for a specific technology node becomes smaller. For the sub-22 nm half-pitch (HP) node, it was demonstrated that exposure to high power megasonic up to 200 W/cm{sup 2} did not damage 60 nm wide TaBN absorber lines corresponding to the 16 nm HP node on wafer. An ammonium hydroxide mixture and megasonics removes {ge}50 nm SiO{sub 2} particles with a very high PRE, A sulfuric acid hydrogen peroxide mixture (SPM) in addition to ammonium hydroxide mixture (APM) and megasonic is required to remove {ge}28 nm SiO{sub 2} particles with a high PRE. Time-of-flight secondary ion mass spectroscopy (TOFSIMS) studies show that the presence of O{sub 2} during a vacuum ultraviolet (VUV) ({lambda} = 172 nm) surface conditioning step will result in both surface oxidation and Ru removal, which drastically reduce extreme ultraviolet (EUV) mask life time under multiple cleanings. New EUV mask cleaning processes show negligible or no EUV reflectivity loss and no increase in surface roughness after up to 15 cleaning cycles. Reviewing of defect with a high current density scanning electron microscope (SEM) drastically reduces PRE and deforms SiO{sub 2} particles. 28 nm SiO{submore »« less

Authors:: Rastegar, A; Eichenlaub, S; Kadaksham, A J; Lee, B; House, M; Huh, S; Cha, B; Yun, H; Mochi, I; Goldberg, K A

Publication Date:: Fri Mar 12 00:00:00 EST 2010

Research Org.:: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)

Sponsoring Org.:: Materials Sciences Division

OSTI Identifier:: 983189

Report Number(s):: LBNL-3332E
TRN: US201014%%820

DOE Contract Number:: DE-AC02-05CH11231

Resource Type:: Conference

Resource Relation:: Conference: SPIE advanced lithography, San Jose, CA, February 21-25, 2010

Country of Publication:: United States

Language:: English

Subject:: 36; AMMONIUM HYDROXIDES; CLEANING; CURRENT DENSITY; DEFECTS; EFFICIENCY; ELECTRON MICROSCOPES; HYDROGEN PEROXIDE; MASS SPECTROSCOPY; MIXTURES; OXIDATION; REFLECTIVITY; REMOVAL; ROUGHNESS; SULFURIC ACID; WAVELENGTHS

Citation Formats


                    Rastegar, A, Eichenlaub, S, Kadaksham, A J, Lee, B, House, M, Huh, S, Cha, B, Yun, H, Mochi, I, and Goldberg, K A. Particle removal challenges with EUV patterned mask for the sub-22nm HP node.  United States: N. p., 2010. 
        Web.

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                    Rastegar, A, Eichenlaub, S, Kadaksham, A J, Lee, B, House, M, Huh, S, Cha, B, Yun, H, Mochi, I, & Goldberg, K A. Particle removal challenges with EUV patterned mask for the sub-22nm HP node.  United States.

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                    Rastegar, A, Eichenlaub, S, Kadaksham, A J, Lee, B, House, M, Huh, S, Cha, B, Yun, H, Mochi, I, and Goldberg, K A. 2010.  
        "Particle removal challenges with EUV patterned mask for the sub-22nm HP node".  United States.  https://www.osti.gov/servlets/purl/983189.

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@article{osti_983189,

  title        = {Particle removal challenges with EUV patterned mask for the sub-22nm HP node},

  author       = {Rastegar, A and Eichenlaub, S and Kadaksham, A J and Lee, B and House, M and Huh, S and Cha, B and Yun, H and Mochi, I and Goldberg, K A},

  abstractNote = {The particle removal efficiency (PRE) of cleaning processes diminishes whenever the minimum defect size for a specific technology node becomes smaller. For the sub-22 nm half-pitch (HP) node, it was demonstrated that exposure to high power megasonic up to 200 W/cm{sup 2} did not damage 60 nm wide TaBN absorber lines corresponding to the 16 nm HP node on wafer. An ammonium hydroxide mixture and megasonics removes {ge}50 nm SiO{sub 2} particles with a very high PRE, A sulfuric acid hydrogen peroxide mixture (SPM) in addition to ammonium hydroxide mixture (APM) and megasonic is required to remove {ge}28 nm SiO{sub 2} particles with a high PRE. Time-of-flight secondary ion mass spectroscopy (TOFSIMS) studies show that the presence of O{sub 2} during a vacuum ultraviolet (VUV) ({lambda} = 172 nm) surface conditioning step will result in both surface oxidation and Ru removal, which drastically reduce extreme ultraviolet (EUV) mask life time under multiple cleanings. New EUV mask cleaning processes show negligible or no EUV reflectivity loss and no increase in surface roughness after up to 15 cleaning cycles. Reviewing of defect with a high current density scanning electron microscope (SEM) drastically reduces PRE and deforms SiO{sub 2} particles. 28 nm SiO{sub 2} particles on EUV masks age very fast and will deform over time, Care must be taken when reviewing EUV mask defects by SEM. Potentially new particles should be identified to calibrate short wavelength inspection tools, Based on actinic image review, 50 nm SiO{sub 2} particles on top of the EUV mask will be printed on the wafer.},

  doi          = {},

  url          = {https://www.osti.gov/biblio/983189},
  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Fri Mar 12 00:00:00 EST 2010},

  month        = {Fri Mar 12 00:00:00 EST 2010}

}

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