Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time
Abstract
In this paper, the corner rounding bias of a commercially available extreme ultraviolet photoresist is monitored as molecular weight, photoacid generator (PAG) size, and development time are varied. These experiments show that PAG size influences corner biasing while molecular weight and development time do not. Large PAGs are shown to exhibit less corner biasing, and in some cases, lower corner rounding, than small PAGs. In addition, heavier resist polymers are shown to exhibit less corner rounding than lighter ones.
- Authors:
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- Materials Sciences Division
- OSTI Identifier:
- 982925
- Report Number(s):
- LBNL-3147E
TRN: US201014%%155
- DOE Contract Number:
- DE-AC02-05CH11231
- Resource Type:
- Conference
- Resource Relation:
- Conference: SPIE Advanced Lithography, San Jose, CA, February 22-25, 2010
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36; MOLECULAR WEIGHT; POLYMERS; TUNING
Citation Formats
Anderson, Christopher, Daggett, Joe, and Naulleau, Patrick. Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time. United States: N. p., 2009.
Web.
Anderson, Christopher, Daggett, Joe, & Naulleau, Patrick. Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time. United States.
Anderson, Christopher, Daggett, Joe, and Naulleau, Patrick. 2009.
"Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time". United States. https://www.osti.gov/servlets/purl/982925.
@article{osti_982925,
title = {Corner rounding in EUV photoresist: tuning through molecular weight, PAG size, and development time},
author = {Anderson, Christopher and Daggett, Joe and Naulleau, Patrick},
abstractNote = {In this paper, the corner rounding bias of a commercially available extreme ultraviolet photoresist is monitored as molecular weight, photoacid generator (PAG) size, and development time are varied. These experiments show that PAG size influences corner biasing while molecular weight and development time do not. Large PAGs are shown to exhibit less corner biasing, and in some cases, lower corner rounding, than small PAGs. In addition, heavier resist polymers are shown to exhibit less corner rounding than lighter ones.},
doi = {},
url = {https://www.osti.gov/biblio/982925},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Dec 31 00:00:00 EST 2009},
month = {Thu Dec 31 00:00:00 EST 2009}
}
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