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Methods of making monolayers

Patent ·
OSTI ID:979382
 [1];  [2];  [3];  [3];  [4];  [3];  [2]
  1. Pasco, WA
  2. Kennewick, WA
  3. Richland, WA
  4. Albuquerque, NM
+ Show Author Affiliations

The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.

Research Organization:
Pacific Northwest National Laboratory (PNNL), Richland, WA
Sponsoring Organization:
USDOE
DOE Contract Number:
AC06-76RL01830
Assignee:
Battelle Memorial Insitute (Richland, WA)
Patent Number(s):
7,629,028
Application Number:
10/607,870
OSTI ID:
979382
Country of Publication:
United States
Language:
English

References (4)

Functionalized Monolayers on Ordered Mesoporous Supports journal May 1997
Deposition of Self-Assembled Monolayers in Mesoporous Silica from Supercritical Fluids journal December 2001
Supercritical processing of functionalized size selective microporous materials journal May 2000
Hybrid Mesoporous Materials with Functionalized Monolayers journal January 1998

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Related Subjects

36 MATERIALS SCIENCE