Photoinduced refractive index change and absorption bleaching in poly(methylphenylsilane) under varied atmospheres.

Simmons-Potter, Kelly; Chandra, Haripin; Jamison, Gregory Marks

Title: Photoinduced refractive index change and absorption bleaching in poly(methylphenylsilane) under varied atmospheres.

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Abstract

Polysilane materials exhibit large photo-induced refractive index changes under low incident optical fluences, making them attractive candidates for applications in which rapid patterning of photonic device structures is desired immediately prior to their use. This agile fabrication strategy for integrated photonics inherently requires that optical exposure, and associated material response, occurs in nonlaboratory environments, motivating the study of environmental conditions on the photoinduced response of the material. The present work examines the impact of atmosphere on the photosensitive response of poly(methylphenylsilane) (PMPS) thin films in terms of both photoinduced absorption change and refractive index modification. Material was subjected to UV light exposure resonant with the lowest energy optical transition associated with the conjugated Si-Si backbone. Exposures were performed in both aerobic and anaerobic atmospheres (oxygen, air, nitrogen, and 5% H{sub 2}/95% N{sub 2}). The results clearly demonstrate that the photosensitive response of this model polysilane material was dramatically affected by local environment, exhibiting a photoinduced refractive index change, when exposed under an oxygen containing atmosphere, that was twice that observed under anaerobic conditions. This effect is discussed in terms of photo-oxidation processes within the polysilane structure and in the context of the need for predictable photosensitive refractive index change inmore » varied photoimprinting environments.« less

Authors:

Simmons-Potter, Kelly ^[1]; Chandra, Haripin ^[1]; Jamison, Gregory Marks

University of Arizona, Tucson, AZ

Publication Date:: Wed Jun 01 00:00:00 EDT 2005

Research Org.:: Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 971415

Report Number(s):: SAND2005-3440J
TRN: US201004%%2

DOE Contract Number:: AC04-94AL85000

Resource Type:: Journal Article

Journal Name:: Proposed for publication in the Journal of Physics and Chemistry of Glass.

Additional Journal Information:: Journal Name: Proposed for publication in the Journal of Physics and Chemistry of Glass.

Country of Publication:: United States

Language:: English

Subject:: 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; SILANES; POLYMERS; ABSORPTION; PHOTOSENSITIVITY; ANAEROBIC CONDITIONS; BLEACHING; FABRICATION; REFRACTIVE INDEX; AEROBIC CONDITIONS; ULTRAVIOLET RADIATION

Citation Formats


                    Potter, Barrett George, Jr., Simmons-Potter, Kelly, Chandra, Haripin, Thomes, William Joseph, Jr., and Jamison, Gregory Marks. Photoinduced refractive index change and absorption bleaching in poly(methylphenylsilane) under varied atmospheres..  United States: N. p., 2005. 
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                    Potter, Barrett George, Jr., Simmons-Potter, Kelly, Chandra, Haripin, Thomes, William Joseph, Jr., & Jamison, Gregory Marks. Photoinduced refractive index change and absorption bleaching in poly(methylphenylsilane) under varied atmospheres..  United States.

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                    Potter, Barrett George, Jr., Simmons-Potter, Kelly, Chandra, Haripin, Thomes, William Joseph, Jr., and Jamison, Gregory Marks. 2005.  
        "Photoinduced refractive index change and absorption bleaching in poly(methylphenylsilane) under varied atmospheres.".  United States.

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@article{osti_971415,

  title        = {Photoinduced refractive index change and absorption bleaching in poly(methylphenylsilane) under varied atmospheres.},

  author       = {Potter, Barrett George, Jr. and Simmons-Potter, Kelly and Chandra, Haripin and Thomes, William Joseph, Jr. and Jamison, Gregory Marks},

  abstractNote = {Polysilane materials exhibit large photo-induced refractive index changes under low incident optical fluences, making them attractive candidates for applications in which rapid patterning of photonic device structures is desired immediately prior to their use. This agile fabrication strategy for integrated photonics inherently requires that optical exposure, and associated material response, occurs in nonlaboratory environments, motivating the study of environmental conditions on the photoinduced response of the material. The present work examines the impact of atmosphere on the photosensitive response of poly(methylphenylsilane) (PMPS) thin films in terms of both photoinduced absorption change and refractive index modification. Material was subjected to UV light exposure resonant with the lowest energy optical transition associated with the conjugated Si-Si backbone. Exposures were performed in both aerobic and anaerobic atmospheres (oxygen, air, nitrogen, and 5% H{sub 2}/95% N{sub 2}). The results clearly demonstrate that the photosensitive response of this model polysilane material was dramatically affected by local environment, exhibiting a photoinduced refractive index change, when exposed under an oxygen containing atmosphere, that was twice that observed under anaerobic conditions. This effect is discussed in terms of photo-oxidation processes within the polysilane structure and in the context of the need for predictable photosensitive refractive index change in varied photoimprinting environments.},

  doi          = {},

  url          = {https://www.osti.gov/biblio/971415},
  journal      = {Proposed for publication in the Journal of Physics and Chemistry of Glass.},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {Wed Jun 01 00:00:00 EDT 2005},

  month        = {Wed Jun 01 00:00:00 EDT 2005}

}

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