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Title: Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches

Abstract

The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 50 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer beneath the PCSS contacts which is very effective in the suppression of filament formation and alleviating current crowding to improve the longevity of PCSS. Virtually indefinite, damage-free operation is now possible at much higher current levels than before. The inherent damage-free current capacity of the switch depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approximately}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.

Authors:
; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Sandia National Labs., Albuquerque, NM (US); Sandia National Labs., Livermore, CA (US)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
9698
Report Number(s):
SAND99-2051C
TRN: AH200125%%14
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: 1999 Pulsed Power Conference, Monterey, CA (US), 06/27/1999--07/01/1999; Other Information: PBD: 5 Aug 1999
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; FABRICATION; PERFORMANCE; SEMICONDUCTOR SWITCHES; THICKNESS; PHOTOCONDUCTIVITY; GALLIUM ARSENIDES; SERVICE LIFE; ELECTRIC CONTACTS; DOPED MATERIALS

Citation Formats

Baca, A.G., Brown, D.J., Donaldson, R.D., Helgeson, W.D., Hjalmarson, H.P., Loubriel, G.M., Mar, A., O'Malley, M.W., Thornton, R.L., and Zutavern, F.J. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches. United States: N. p., 1999. Web.
Baca, A.G., Brown, D.J., Donaldson, R.D., Helgeson, W.D., Hjalmarson, H.P., Loubriel, G.M., Mar, A., O'Malley, M.W., Thornton, R.L., & Zutavern, F.J. Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches. United States.
Baca, A.G., Brown, D.J., Donaldson, R.D., Helgeson, W.D., Hjalmarson, H.P., Loubriel, G.M., Mar, A., O'Malley, M.W., Thornton, R.L., and Zutavern, F.J. Thu . "Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches". United States. https://www.osti.gov/servlets/purl/9698.
@article{osti_9698,
title = {Doped Contacts for High-Longevity Optically Activated, High Gain GaAs Photoconductive Semiconductor Switches},
author = {Baca, A.G. and Brown, D.J. and Donaldson, R.D. and Helgeson, W.D. and Hjalmarson, H.P. and Loubriel, G.M. and Mar, A. and O'Malley, M.W. and Thornton, R.L. and Zutavern, F.J.},
abstractNote = {The longevity of high gain GaAs photoconductive semiconductor switches (PCSS) has been extended to over 50 million pulses. This was achieved by improving the ohmic contacts through the incorporation of a doped layer beneath the PCSS contacts which is very effective in the suppression of filament formation and alleviating current crowding to improve the longevity of PCSS. Virtually indefinite, damage-free operation is now possible at much higher current levels than before. The inherent damage-free current capacity of the switch depends on the thickness of the doped layers and is at least 100A for a dopant diffusion depth of 4pm. The contact metal has a different damage mechanism and the threshold for damage ({approximately}40A) is not further improved beyond a dopant diffusion depth of about 2{micro}m. In a diffusion-doped contact switch, the switching performance is not degraded when contact metal erosion occurs. This paper will compare thermal diffusion and epitaxial growth as approaches to doping the contacts. These techniques will be contrasted in terms of the fabrication issues and device characteristics.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {8}
}

Conference:
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