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Title: Device fabrication and transport measurements of FinFETs built with 28Si SOI wafers towards donor qubits in silicon

Journal Article · · Semiconductor Science and Technology
OSTI ID:965794

We report fabrication of transistors in a FinFET geometry using isotopically purified silicon-28 -on-insulator (28-SOI) substrates. Donor electron spin coherence in natural silicon is limited by spectral diffusion due to the residual 29Si nuclear spin bath, making isotopically enriched nuclear spin-free 28Si substrates a promising candidate for forming spin quantum bit devices. The FinFET architecture is fully compatible with single-ion implant detection for donor-based qubits, and the donor spin-state readout through electrical detection of spin resonance. We describe device processing steps and discuss results on electrical transport measurements at 0.3 K.

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
Accelerator& Fusion Research Division
DOE Contract Number:
DE-AC02-05CH11231
OSTI ID:
965794
Report Number(s):
LBNL-2204E; SSTEET; TRN: US200919%%731
Journal Information:
Semiconductor Science and Technology, Journal Name: Semiconductor Science and Technology; ISSN 0268-1242
Country of Publication:
United States
Language:
English