Bulk Defects in Nano-Crystalline And in Non-Crystalline HfO(2)-Based Thin Film Dielectrics
Journal Article
·
· Thin Solid Films 517:437,2008
OSTI ID:953085
- Research Organization:
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-76SF00515
- OSTI ID:
- 953085
- Report Number(s):
- SLAC-REPRINT-2009-199
- Journal Information:
- Thin Solid Films 517:437,2008, Journal Name: Thin Solid Films 517:437,2008
- Country of Publication:
- United States
- Language:
- English
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