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Title: Recent results from the Berkeley 0.3-NA microfield exposure tool

Abstract

Operating as a SEMATECH resist test center, the Berkeley 0.3-NA EUV microfield exposure tool continues to play a crucial role in the advancement of EUV resists and masks. Here we present recent resist-characterization results from the tool as well as tool-characterization data. In particular we present lithographic-based aberration measurements demonstrating the long-term stability of the tool. We also describe a recent upgrade to the tool which involved redesign of the programmable coherence illuminator to provide improved field uniformity as well as a programmable field size.

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
Materials Sciences Division
OSTI Identifier:
951108
Report Number(s):
LBNL-61492
TRN: US200911%%274
DOE Contract Number:
DE-AC02-05CH11231
Resource Type:
Conference
Resource Relation:
Conference: Advanced Lithography 2007, San Jose, CA, Feb. 25 - March 3, 2007
Country of Publication:
United States
Language:
English
Subject:
36; STABILITY; MASKING; EXTREME ULTRAVIOLET RADIATION; TOOLS; COMPUTERIZED CONTROL SYSTEMS; DESIGN; MODIFICATIONS

Citation Formats

Naulleau, Patrick, Anderson, Christopher N., Dean, Kim, Denham, Paul, Goldberg, Kenneth A., Hoef, Brian, La Fontaine, Bruno, and Wallow, Tom. Recent results from the Berkeley 0.3-NA microfield exposure tool. United States: N. p., 2007. Web.
Naulleau, Patrick, Anderson, Christopher N., Dean, Kim, Denham, Paul, Goldberg, Kenneth A., Hoef, Brian, La Fontaine, Bruno, & Wallow, Tom. Recent results from the Berkeley 0.3-NA microfield exposure tool. United States.
Naulleau, Patrick, Anderson, Christopher N., Dean, Kim, Denham, Paul, Goldberg, Kenneth A., Hoef, Brian, La Fontaine, Bruno, and Wallow, Tom. Thu . "Recent results from the Berkeley 0.3-NA microfield exposure tool". United States. doi:. https://www.osti.gov/servlets/purl/951108.
@article{osti_951108,
title = {Recent results from the Berkeley 0.3-NA microfield exposure tool},
author = {Naulleau, Patrick and Anderson, Christopher N. and Dean, Kim and Denham, Paul and Goldberg, Kenneth A. and Hoef, Brian and La Fontaine, Bruno and Wallow, Tom},
abstractNote = {Operating as a SEMATECH resist test center, the Berkeley 0.3-NA EUV microfield exposure tool continues to play a crucial role in the advancement of EUV resists and masks. Here we present recent resist-characterization results from the tool as well as tool-characterization data. In particular we present lithographic-based aberration measurements demonstrating the long-term stability of the tool. We also describe a recent upgrade to the tool which involved redesign of the programmable coherence illuminator to provide improved field uniformity as well as a programmable field size.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Mar 01 00:00:00 EST 2007},
month = {Thu Mar 01 00:00:00 EST 2007}
}

Conference:
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