A method for sputtering with low frequency alternating current
Low frequency alternating current sputtering is provided by connecting a low frequency alternating current to a high voltage transformer having outer taps and a center tap for stepping up the voltage of the alternating currentThe center tap of the tmsformer is connected to a vacuum vessel containing argon or helium gas. Target electrodes, in close proximity to each other, and containing material with which the substrates will be coated, are connected to the outer taps of the ftwsformer. With an applied potential, the gas will ionize and sputtering from the target electrodes onto the substrate will then result. The target electrodes can be copper or boron, and the substrate can be stainless steel, aluminum, or titanium. Copper coatings produced are used in place of nickel and/or copper striking.
- Research Organization:
- Princeton Univ., NJ (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC02-76CH03073
- Assignee:
- Dept. of Energy
- Patent Number(s):
- PATENTS-US-A8070835
- Application Number:
- ON: DE95017115; PAN: 8-070,835
- OSTI ID:
- 94665
- Resource Relation:
- Other Information: PBD: 1993
- Country of Publication:
- United States
- Language:
- English
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