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Title: Effect of Thermal Annealing on Photoelectrochemical Responses of WO3 Thin Films

Abstract

The photoelectrochemical responses of WO{sub 3} thin films have been investigated as a function of annealing temperature up to 600 C. WO{sub 3} films were deposited on unheated substrates by thermal evaporation followed by annealing at temperatures of 300, 500, and 600 C for 5 h in air. The WO{sub 3} film annealed at 500 C shows the best photoelectrochemical response due to improved crystallinity and enhanced light absorption in the long-wavelength region. Although the WO{sub 3} film annealed at 600 C exhibits better crystallinity and increased light absorption properties, it shows a decreased photoelectrochemical response in comparison to the one annealed at 500 C. These results strongly suggests that the reduced amount of electrochemical reaction sites for the film annealed at 600 C film plays a significant role in influencing the decreased photoresponse.

Authors:
; ; ; ;
Publication Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
944496
DOE Contract Number:  
AC36-99-GO10337
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 101; Journal Issue: 9, 2007; Related Information: Article No. 093524; Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
08 HYDROGEN; 14 SOLAR ENERGY; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ABSORPTION; AIR; ANNEALING; EVAPORATION; SUBSTRATES; THIN FILMS; Solar Energy - Photovoltaics

Citation Formats

Ahn, K S, Lee, S H, Dillon, A C, Tracy, C E, and Pitts, R. Effect of Thermal Annealing on Photoelectrochemical Responses of WO3 Thin Films. United States: N. p., 2007. Web. doi:10.1063/1.2729472.
Ahn, K S, Lee, S H, Dillon, A C, Tracy, C E, & Pitts, R. Effect of Thermal Annealing on Photoelectrochemical Responses of WO3 Thin Films. United States. doi:10.1063/1.2729472.
Ahn, K S, Lee, S H, Dillon, A C, Tracy, C E, and Pitts, R. Mon . "Effect of Thermal Annealing on Photoelectrochemical Responses of WO3 Thin Films". United States. doi:10.1063/1.2729472.
@article{osti_944496,
title = {Effect of Thermal Annealing on Photoelectrochemical Responses of WO3 Thin Films},
author = {Ahn, K S and Lee, S H and Dillon, A C and Tracy, C E and Pitts, R},
abstractNote = {The photoelectrochemical responses of WO{sub 3} thin films have been investigated as a function of annealing temperature up to 600 C. WO{sub 3} films were deposited on unheated substrates by thermal evaporation followed by annealing at temperatures of 300, 500, and 600 C for 5 h in air. The WO{sub 3} film annealed at 500 C shows the best photoelectrochemical response due to improved crystallinity and enhanced light absorption in the long-wavelength region. Although the WO{sub 3} film annealed at 600 C exhibits better crystallinity and increased light absorption properties, it shows a decreased photoelectrochemical response in comparison to the one annealed at 500 C. These results strongly suggests that the reduced amount of electrochemical reaction sites for the film annealed at 600 C film plays a significant role in influencing the decreased photoresponse.},
doi = {10.1063/1.2729472},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 9, 2007,
volume = 101,
place = {United States},
year = {2007},
month = {1}
}