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Title: ESTIMATING THE STRENGTH OF SINGLE-ENDED DISLOCATION SOURCES IN MICROMETER-SIZED SINGLE CRYSTALS

Journal Article · · Philosophical Magazine , vol. 87, no. 30, January 10, 2007, pp. 4777-4794
OSTI ID:942032

A recent study indicated that the behavior of single-ended dislocation sources contributes to the flow strength of micrometer-scale crystals. In this study 3D discrete dislocation dynamics simulations of micrometer-sized volumes are used to calculate the effects of anisotropy of dislocation line tension (increasing Poisson's ratio, {nu}) on the strength of single-ended dislocation sources and, to compare them with the strength of double-ended sources of equal length. This is done by directly modeling their plastic response within a 1 micron cubed FCC Ni single crystal using DDS. In general, double-ended sources are stronger than single-ended sources of an equal length and exhibit no significant effects from truncating the long-range elastic fields at this scale. The double-ended source strength increases with Poisson ratio ({nu}), exhibiting an increase of about 50% at u = 0.38 (value for Ni) as compared to the value at {nu} = 0. Independent of dislocation line direction, for {nu} greater than 0.20, the strengths of single-ended sources depend upon the sense of the stress applied. The value for {alpha}, in the expression for strength, {tau} = {alpha}(L){micro}b/L is shown to vary from 0.4 to 0.84 depending upon the character of the dislocation and the direction of operation of the source at {nu} corresponding to that of Ni, 0.38 and a length of 933b. By varying the lengths of the sources from 933b to 233b, it was shown that the scaling of the strength of single-ended and double-ended sources with their length both follow a ln(L/b)/(L/b) dependence. Surface image stresses are shown to have little effect on the critical stress of single-ended sources at a length of {approx}250b or greater. The relationship between these findings and a recent statistical model for the hardening of small volumes is also discussed.

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
942032
Report Number(s):
UCRL-JRNL-230783; TRN: US200825%%726
Journal Information:
Philosophical Magazine , vol. 87, no. 30, January 10, 2007, pp. 4777-4794, Vol. 87, Issue 30
Country of Publication:
United States
Language:
English

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