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Title: Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography

Abstract

This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 {micro}m{sup 2} field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms to achieve sub-diffraction-limited performance. This work represents the first experimental demonstration of sub-diffraction-limited multilayer coatings for high-NA EUV imaging systems.

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
940483
Report Number(s):
UCRL-JRNL-227199
Journal ID: ISSN 0003-6935; APOPAI; TRN: US200824%%46
DOE Contract Number:
W-7405-ENG-48
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Optics, vol. 46, no. 18, June 20, 2007, pp. 3736-3746; Journal Volume: 46; Journal Issue: 18
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUMM MECHANICS, GENERAL PHYSICS; APERTURES; CAMERAS; COATINGS; MIRRORS; MODULATION; PERFORMANCE; SPUTTERING; SUBSTRATES; THICKNESS; VELOCITY; WAVELENGTHS

Citation Formats

Soufli, R, Hudyma, R M, Spiller, E, Gullikson, E M, Schmidt, M A, Robinson, J C, Baker, S L, Walton, C C, and Taylor, J S. Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography. United States: N. p., 2007. Web.
Soufli, R, Hudyma, R M, Spiller, E, Gullikson, E M, Schmidt, M A, Robinson, J C, Baker, S L, Walton, C C, & Taylor, J S. Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography. United States.
Soufli, R, Hudyma, R M, Spiller, E, Gullikson, E M, Schmidt, M A, Robinson, J C, Baker, S L, Walton, C C, and Taylor, J S. Wed . "Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography". United States. doi:. https://www.osti.gov/servlets/purl/940483.
@article{osti_940483,
title = {Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography},
author = {Soufli, R and Hudyma, R M and Spiller, E and Gullikson, E M and Schmidt, M A and Robinson, J C and Baker, S L and Walton, C C and Taylor, J S},
abstractNote = {This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 {micro}m{sup 2} field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms to achieve sub-diffraction-limited performance. This work represents the first experimental demonstration of sub-diffraction-limited multilayer coatings for high-NA EUV imaging systems.},
doi = {},
journal = {Applied Optics, vol. 46, no. 18, June 20, 2007, pp. 3736-3746},
number = 18,
volume = 46,
place = {United States},
year = {Wed Jan 03 00:00:00 EST 2007},
month = {Wed Jan 03 00:00:00 EST 2007}
}