Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography
This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 {micro}m{sup 2} field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve multilayer thickness profiles with added figure errors below 0.1 nm rms to achieve sub-diffraction-limited performance. This work represents the first experimental demonstration of sub-diffraction-limited multilayer coatings for high-NA EUV imaging systems.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 940483
- Report Number(s):
- UCRL-JRNL-227199; APOPAI; TRN: US200824%%46
- Journal Information:
- Applied Optics, Vol. 46, Issue 18; ISSN 0003-6935
- Country of Publication:
- United States
- Language:
- English
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