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Title: Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory

Abstract

The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace Profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performance and characteristics of the upgraded LTP-II at the ALS Optical Metrology Laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms)slope variation.

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
Advanced Light Source Division; Engineering Division
OSTI Identifier:
935333
Report Number(s):
LBNL-631E
TRN: US0804264
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Conference
Resource Relation:
Conference: Optical Engineering and Applications 2008, part of SPIE Optics and Photonics 2008;Conference #7707: Advances in X-Ray/EUV Optics and Components III, San Diego, CA, August 10-14, 2008
Country of Publication:
United States
Language:
English
Subject:
47; CALIBRATION; CONTROL SYSTEMS; DESIGN; DIFFRACTION; FABRICATION; FREE ELECTRON LASERS; MEASURING INSTRUMENTS; OPTICAL SYSTEMS; OPTICS; PERFORMANCE; SUBSTRATES; SYNCHROTRONS; WAVELENGTHS; slope measuring instrument, long trace profiler, LTP, 2D detector, systematic error reduction

Citation Formats

Advanced Light Source, Yashchuk, Valeriy V, Kirschman, Jonathan L., Domning, Edward E., McKinney, Wayne R., Morrison, Gregory Y., Smith, Brian V., and Yashchuk, Valeriy V. Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory. United States: N. p., 2008. Web.
Advanced Light Source, Yashchuk, Valeriy V, Kirschman, Jonathan L., Domning, Edward E., McKinney, Wayne R., Morrison, Gregory Y., Smith, Brian V., & Yashchuk, Valeriy V. Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory. United States.
Advanced Light Source, Yashchuk, Valeriy V, Kirschman, Jonathan L., Domning, Edward E., McKinney, Wayne R., Morrison, Gregory Y., Smith, Brian V., and Yashchuk, Valeriy V. Mon . "Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory". United States. https://www.osti.gov/servlets/purl/935333.
@article{osti_935333,
title = {Performance of the upgraded LTP-II at the ALS Optical Metrology Laboratory},
author = {Advanced Light Source and Yashchuk, Valeriy V and Kirschman, Jonathan L. and Domning, Edward E. and McKinney, Wayne R. and Morrison, Gregory Y. and Smith, Brian V. and Yashchuk, Valeriy V.},
abstractNote = {The next generation of synchrotrons and free electron laser facilities requires x-ray optical systems with extremely high performance, generally of diffraction limited quality. Fabrication and use of such optics requires adequate, highly accurate metrology and dedicated instrumentation. Previously, we suggested ways to improve the performance of the Long Trace Profiler (LTP), a slope measuring instrument widely used to characterize x-ray optics at long spatial wavelengths. The main way is use of a CCD detector and corresponding technique for calibration of photo-response non-uniformity [J. L. Kirschman, et al., Proceedings of SPIE 6704, 67040J (2007)]. The present work focuses on the performance and characteristics of the upgraded LTP-II at the ALS Optical Metrology Laboratory. This includes a review of the overall aspects of the design, control system, the movement and measurement regimes for the stage, and analysis of the performance by a slope measurement of a highly curved super-quality substrate with less than 0.3 microradian (rms)slope variation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Jul 14 00:00:00 EDT 2008},
month = {Mon Jul 14 00:00:00 EDT 2008}
}

Conference:
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