SIMULATION OF STRAIN INDUCED INTERFACE MIGRATION IN SYMMETRIC TILT GRAIN BOUNDARIES

Conference · Mon Jan 01 00:00:00 EST 2007

OSTI ID:931712

Namilae, Sirish ^[1]; Radhakrishnan, Balasubramaniam ^[1]; Gorti, Sarma B ^[1]

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1. ORNL

Grain boundary migration of flat symmetric tilt grain boundaries is simulated using molecular dynamics. The driving force for migration is achieved by applying uniaxial strain on one of the grains in the bicrystal, enabling the growth of strain free grain at the expense of strained grain. Arrhenius dependence of grain boundary mobility on temperature and a linear relation between mobility and grain boundary velocity are observed. Simulations suggest that the mechanism of migration is dependent on vacancy diffusion combined with local reshuffling of atoms near the grain boundary.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 931712
• Resource Relation: Conference: TMS Annual meeting 07, Orlando, FL, USA, 20070225, 20070225
• Country of Publication: United States
• Language: English