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Title: Chemical Analysis of HfO2/Si (100) Film Systems Exposed to NH3 Thermal Processing

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Brookhaven National Laboratory (BNL) National Synchrotron Light Source
Sponsoring Org.:
Doe - Office Of Science
OSTI Identifier:
930278
Report Number(s):
BNL-80979-2008-JA
DOE Contract Number:
DE-AC02-98CH10886
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 101
Country of Publication:
United States
Language:
English
Subject:
national synchrotron light source

Citation Formats

Lysaght,P., Barnett, J., Bersuker, G., Woicik, J., Fischer, D., Foran, B., Tseng, H., and Jammy, R. Chemical Analysis of HfO2/Si (100) Film Systems Exposed to NH3 Thermal Processing. United States: N. p., 2007. Web. doi:10.1063/1.2422746.
Lysaght,P., Barnett, J., Bersuker, G., Woicik, J., Fischer, D., Foran, B., Tseng, H., & Jammy, R. Chemical Analysis of HfO2/Si (100) Film Systems Exposed to NH3 Thermal Processing. United States. doi:10.1063/1.2422746.
Lysaght,P., Barnett, J., Bersuker, G., Woicik, J., Fischer, D., Foran, B., Tseng, H., and Jammy, R. Mon . "Chemical Analysis of HfO2/Si (100) Film Systems Exposed to NH3 Thermal Processing". United States. doi:10.1063/1.2422746.
@article{osti_930278,
title = {Chemical Analysis of HfO2/Si (100) Film Systems Exposed to NH3 Thermal Processing},
author = {Lysaght,P. and Barnett, J. and Bersuker, G. and Woicik, J. and Fischer, D. and Foran, B. and Tseng, H. and Jammy, R.},
abstractNote = {},
doi = {10.1063/1.2422746},
journal = {Journal of Applied Physics},
number = ,
volume = 101,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2007},
month = {Mon Jan 01 00:00:00 EST 2007}
}