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Title: Atomic Force Microscope (AFM) measurements and analysis on Sagem 05R0025 secondary substrate

Abstract

The summary of Atomic Force Microscope (AFM) on Sagem 05R0025 secondary substrate: (1) 2 x 2 {micro}m{sup 2} and 10 x 10 {micro}m{sup 2} AFM measurements and analysis on Sagem 05R0025 secondary substrate at LLNL indicate rather uniform and extremely isotropic finish across the surface, with high-spatial frequency roughness {sigma} in the range 5.1-5.5 {angstrom} rms; (2) the marked absence of pronounced long-range polishing marks in any direction, combined with increased roughness in the very high spatial frequencies, are consistent with ion-beam polishing treatment on the surface. These observations are consistent with all earlier mirrors they measured from the same vendor; and (3) all data were obtained with a Digital Instruments Dimension 5000{trademark} atomic force microscope.

Authors:
; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
928199
Report Number(s):
UCRL-TR-221616
TRN: US200815%%525
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUMM MECHANICS, GENERAL PHYSICS; DIMENSIONS; LAWRENCE LIVERMORE NATIONAL LABORATORY; MICROSCOPES; MIRRORS; POLISHING; ROUGHNESS; SUBSTRATES

Citation Formats

Soufli, R, Baker, S L, and Robinson, J C. Atomic Force Microscope (AFM) measurements and analysis on Sagem 05R0025 secondary substrate. United States: N. p., 2006. Web. doi:10.2172/928199.
Soufli, R, Baker, S L, & Robinson, J C. Atomic Force Microscope (AFM) measurements and analysis on Sagem 05R0025 secondary substrate. United States. doi:10.2172/928199.
Soufli, R, Baker, S L, and Robinson, J C. Wed . "Atomic Force Microscope (AFM) measurements and analysis on Sagem 05R0025 secondary substrate". United States. doi:10.2172/928199. https://www.osti.gov/servlets/purl/928199.
@article{osti_928199,
title = {Atomic Force Microscope (AFM) measurements and analysis on Sagem 05R0025 secondary substrate},
author = {Soufli, R and Baker, S L and Robinson, J C},
abstractNote = {The summary of Atomic Force Microscope (AFM) on Sagem 05R0025 secondary substrate: (1) 2 x 2 {micro}m{sup 2} and 10 x 10 {micro}m{sup 2} AFM measurements and analysis on Sagem 05R0025 secondary substrate at LLNL indicate rather uniform and extremely isotropic finish across the surface, with high-spatial frequency roughness {sigma} in the range 5.1-5.5 {angstrom} rms; (2) the marked absence of pronounced long-range polishing marks in any direction, combined with increased roughness in the very high spatial frequencies, are consistent with ion-beam polishing treatment on the surface. These observations are consistent with all earlier mirrors they measured from the same vendor; and (3) all data were obtained with a Digital Instruments Dimension 5000{trademark} atomic force microscope.},
doi = {10.2172/928199},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Feb 22 00:00:00 EST 2006},
month = {Wed Feb 22 00:00:00 EST 2006}
}

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