Autocatalytic water dissociation on Cu(110) at near ambient conditions
Journal Article
·
· Journal of the American Chemical Society
OSTI ID:926164
Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated based on X-ray photoelectron spectroscopy studies carried out in-situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H{sub 2}O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Broensted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- Materials Sciences Division
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 926164
- Report Number(s):
- LBNL-99E; JACSAT; TRN: US200807%%502
- Journal Information:
- Journal of the American Chemical Society, Vol. 130, Issue 9; Related Information: Journal Publication Date: 2008; ISSN 0002-7863
- Country of Publication:
- United States
- Language:
- English
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