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Title: Autocatalytic water dissociation on Cu(110) at near ambient conditions

Abstract

Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated based on X-ray photoelectron spectroscopy studies carried out in-situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H{sub 2}O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Broensted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
Materials Sciences Division
OSTI Identifier:
926164
Report Number(s):
LBNL-99E
Journal ID: ISSN 0002-7863; JACSAT; TRN: US200807%%502
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of the American Chemical Society; Journal Volume: 130; Journal Issue: 9; Related Information: Journal Publication Date: 2008
Country of Publication:
United States
Language:
English
Subject:
36; BONDING; DISSOCIATION; WATER; WATER VAPOR; X-RAY PHOTOELECTRON SPECTROSCOPY; Autocatalytic water dissociation WGS

Citation Formats

Mulleregan, Alice, Andersson, Klas, Ketteler, Guido, Bluhm, Hendrik, Yamamoto, Susumu, Ogasawara, Hirohito, Pettersson, Lars G.M., Salmeron, Miquel, and Nilsson, Anders. Autocatalytic water dissociation on Cu(110) at near ambient conditions. United States: N. p., 2007. Web.
Mulleregan, Alice, Andersson, Klas, Ketteler, Guido, Bluhm, Hendrik, Yamamoto, Susumu, Ogasawara, Hirohito, Pettersson, Lars G.M., Salmeron, Miquel, & Nilsson, Anders. Autocatalytic water dissociation on Cu(110) at near ambient conditions. United States.
Mulleregan, Alice, Andersson, Klas, Ketteler, Guido, Bluhm, Hendrik, Yamamoto, Susumu, Ogasawara, Hirohito, Pettersson, Lars G.M., Salmeron, Miquel, and Nilsson, Anders. Wed . "Autocatalytic water dissociation on Cu(110) at near ambient conditions". United States. doi:. https://www.osti.gov/servlets/purl/926164.
@article{osti_926164,
title = {Autocatalytic water dissociation on Cu(110) at near ambient conditions},
author = {Mulleregan, Alice and Andersson, Klas and Ketteler, Guido and Bluhm, Hendrik and Yamamoto, Susumu and Ogasawara, Hirohito and Pettersson, Lars G.M. and Salmeron, Miquel and Nilsson, Anders},
abstractNote = {Autocatalytic dissociation of water on the Cu(110) metal surface is demonstrated based on X-ray photoelectron spectroscopy studies carried out in-situ under near ambient conditions of water vapor pressure (1 Torr) and temperature (275-520 K). The autocatalytic reaction is explained as the result of the strong hydrogen-bond in the H{sub 2}O-OH complex of the dissociated final state, which lowers the water dissociation barrier according to the Broensted-Evans-Polanyi relations. A simple chemical bonding picture is presented which predicts autocatalytic water dissociation to be a general phenomenon on metal surfaces.},
doi = {},
journal = {Journal of the American Chemical Society},
number = 9,
volume = 130,
place = {United States},
year = {Wed May 16 00:00:00 EDT 2007},
month = {Wed May 16 00:00:00 EDT 2007}
}