Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics

Journal Article · Tue May 01 00:00:00 EDT 2007 · Journal of Vacuum Science and Technology B

DOI:https://doi.org/10.1116/1.2798725· OSTI ID:923472

Salmassi, Farhad; Gullikson, Eric M; Anderson, Erik H; Naulleau, Patrick P

The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, and phase-shift masks for advanced lithography. Extending such devices to the increasingly important regime of extreme ultraviolet (EUV) wavelengths, however, is not trivial. Here, we present an effective fabrication and etch process enabling high-resolution patterning of Mo/Si multilayers for use in EUV phase devices, providing another method for fabrication of high numerical aperture diffractive devices or high-resolution EUV phase shift masks.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Director. Office of Science. Basic EnergySciences
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 923472
• Report Number(s): LBNL-63272; R&D Project: 509201; BnR: KC0202020; TRN: US200804%%1179
• Journal Information: Journal of Vacuum Science and Technology B, Vol. 25, Issue 6; Related Information: Journal Publication Date: 11/2007
• Country of Publication: United States
• Language: English

Related Subjects

36
APERTURES
DIFFRACTION GRATINGS
FABRICATION
LENSES
OPTICAL SYSTEMS
OPTICS
PHASE SHIFT
WAVELENGTHS