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Title: Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics

Abstract

The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, and phase-shift masks for advanced lithography. Extending such devices to the increasingly important regime of extreme ultraviolet (EUV) wavelengths, however, is not trivial. Here, we present an effective fabrication and etch process enabling high-resolution patterning of Mo/Si multilayers for use in EUV phase devices, providing another method for fabrication of high numerical aperture diffractive devices or high-resolution EUV phase shift masks.

Authors:
; ; ;
Publication Date:
Research Org.:
Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
Sponsoring Org.:
USDOE Director. Office of Science. Basic EnergySciences
OSTI Identifier:
923472
Report Number(s):
LBNL-63272
R&D Project: 509201; BnR: KC0202020; TRN: US200804%%1179
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology B; Journal Volume: 25; Journal Issue: 6; Related Information: Journal Publication Date: 11/2007
Country of Publication:
United States
Language:
English
Subject:
36; APERTURES; DIFFRACTION GRATINGS; FABRICATION; LENSES; OPTICAL SYSTEMS; OPTICS; PHASE SHIFT; WAVELENGTHS

Citation Formats

Salmassi, Farhad, Gullikson, Eric M., Anderson, Erik H., and Naulleau, Patrick P. Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics. United States: N. p., 2007. Web. doi:10.1116/1.2798725.
Salmassi, Farhad, Gullikson, Eric M., Anderson, Erik H., & Naulleau, Patrick P. Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics. United States. doi:10.1116/1.2798725.
Salmassi, Farhad, Gullikson, Eric M., Anderson, Erik H., and Naulleau, Patrick P. Tue . "Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics". United States. doi:10.1116/1.2798725. https://www.osti.gov/servlets/purl/923472.
@article{osti_923472,
title = {Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics},
author = {Salmassi, Farhad and Gullikson, Eric M. and Anderson, Erik H. and Naulleau, Patrick P.},
abstractNote = {The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, and phase-shift masks for advanced lithography. Extending such devices to the increasingly important regime of extreme ultraviolet (EUV) wavelengths, however, is not trivial. Here, we present an effective fabrication and etch process enabling high-resolution patterning of Mo/Si multilayers for use in EUV phase devices, providing another method for fabrication of high numerical aperture diffractive devices or high-resolution EUV phase shift masks.},
doi = {10.1116/1.2798725},
journal = {Journal of Vacuum Science and Technology B},
number = 6,
volume = 25,
place = {United States},
year = {Tue May 01 00:00:00 EDT 2007},
month = {Tue May 01 00:00:00 EDT 2007}
}