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Title: On the influence of ion incorporation in thin films of block copolymers.

Abstract

No abstract prepared.

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC); National Science Foundation (NSF); US Army Research Office (ARO)
OSTI Identifier:
922917
Report Number(s):
ANL/XSD/JA-60814
Journal ID: ISSN 0935-9648; ADVMEW; TRN: US200804%%634
DOE Contract Number:
DE-AC02-06CH11357
Resource Type:
Journal Article
Resource Relation:
Journal Name: Adv. Mater.; Journal Volume: 19; Journal Issue: 24 ; 2007
Country of Publication:
United States
Language:
ENGLISH
Subject:
36 MATERIALS SCIENCE; COPOLYMERS; THIN FILMS; IONS; DOPED MATERIALS

Citation Formats

He, J., Wang, J.-Y., Xu, J., Tangirala, R., Shin, D., Russell, T. P., Li, X., Wang, J., and Univ. of Massachusetts. On the influence of ion incorporation in thin films of block copolymers.. United States: N. p., 2007. Web. doi:10.1002/adma.200602877.
He, J., Wang, J.-Y., Xu, J., Tangirala, R., Shin, D., Russell, T. P., Li, X., Wang, J., & Univ. of Massachusetts. On the influence of ion incorporation in thin films of block copolymers.. United States. doi:10.1002/adma.200602877.
He, J., Wang, J.-Y., Xu, J., Tangirala, R., Shin, D., Russell, T. P., Li, X., Wang, J., and Univ. of Massachusetts. Mon . "On the influence of ion incorporation in thin films of block copolymers.". United States. doi:10.1002/adma.200602877.
@article{osti_922917,
title = {On the influence of ion incorporation in thin films of block copolymers.},
author = {He, J. and Wang, J.-Y. and Xu, J. and Tangirala, R. and Shin, D. and Russell, T. P. and Li, X. and Wang, J. and Univ. of Massachusetts},
abstractNote = {No abstract prepared.},
doi = {10.1002/adma.200602877},
journal = {Adv. Mater.},
number = 24 ; 2007,
volume = 19,
place = {United States},
year = {Mon Jan 01 00:00:00 EST 2007},
month = {Mon Jan 01 00:00:00 EST 2007}
}
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