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Title: Low-cost method for producing extreme ultraviolet lithography optics

Abstract

Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.

Inventors:
 [1];  [2];  [1];  [3]
  1. Livermore, CA
  2. Fort Collins, CO
  3. Mt. Kisco, NY
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
921901
Patent Number(s):
6,634,760
Application Number:
09/940,099
Assignee:
The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Folta, James A, Montcalm, Claude, Taylor, John S, and Spiller, Eberhard A. Low-cost method for producing extreme ultraviolet lithography optics. United States: N. p., 2003. Web.
Folta, James A, Montcalm, Claude, Taylor, John S, & Spiller, Eberhard A. Low-cost method for producing extreme ultraviolet lithography optics. United States.
Folta, James A, Montcalm, Claude, Taylor, John S, and Spiller, Eberhard A. Fri . "Low-cost method for producing extreme ultraviolet lithography optics". United States. https://www.osti.gov/servlets/purl/921901.
@article{osti_921901,
title = {Low-cost method for producing extreme ultraviolet lithography optics},
author = {Folta, James A and Montcalm, Claude and Taylor, John S and Spiller, Eberhard A},
abstractNote = {Spherical and non-spherical optical elements produced by standard optical figuring and polishing techniques are extremely expensive. Such surfaces can be cheaply produced by diamond turning; however, the roughness in the diamond turned surface prevent their use for EUV lithography. These ripples are smoothed with a coating of polyimide before applying a 60 period Mo/Si multilayer to reflect a wavelength of 134 .ANG. and have obtained peak reflectivities close to 63%. The savings in cost are about a factor of 100.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2003},
month = {11}
}

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