Method of produce ultra-low friction carbon films

Patent · 15 April 2003

OSTI ID:921345

Erdemir, Ali ^[1]; Fenske, George R ^[2]; Eryilmaz, Osman Levent ^[3]; Lee, Richard H ^[4]

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1. Naperville, IL
2. Downers Grove, IL
3. Istanbul, TK
4. Lemont, IL

A method and article of manufacture of amorphous diamond-like carbon. The method involves providing a substrate in a chamber, providing a mixture of a carbon containing gas and hydrogen gas with the mixture adjusted such that the atomic molar ratio of carbon to hydrogen is less than 0.3, including all carbon atoms and all hydrogen atoms in the mixture. A plasma is formed of the mixture and the amorphous diamond-like carbon film is deposited on the substrate. To achieve optimum bonding an intervening bonding layer, such as Si or SiO.sub.2, can be formed from SiH.sub.4 with or without oxidation of the layer formed.

• Research Organization: Argonne National Laboratory (ANL), Argonne, IL
• Sponsoring Organization: United States Department of Energy
• DOE Contract Number: W-31109-ENG-38
• Assignee: Argonne National Laboratory (Argonne, IL)
• Patent Number(s): 6,548,173
• Application Number: 09/808,632
• OSTI ID: 921345
• Country of Publication: United States
• Language: English