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Title: Growth and surface characterization of sputter-deposited molybdenum oxide thin films

Abstract

Molybdenum oxide thin films were produced by magnetron sputtering using a molybdenum (Mo) target. The sputtering was performed in a reactive atmosphere of argon-oxygen gas mixture under varying conditions of substrate temperature (Ts) and oxygen partial pressure (pO2). The effect of Ts and pO2 on the growth and microstructure of molybdenum oxide films was examined in detail using reflection high-energy electron diffraction (RHEED), Rutherford backscattering spectrometry (RBS), energy dispersive X-ray spectrometry (EDS), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM) measurements. The analyses indicate that the effect of Ts and pO2 on the microstructure and phase of the grown molybdenum oxide thin films is remarkable. RHEED and RBS results indicate that the films grown at 445 *C under 62.3% O2 pressure were stoichiometric and polycrystalline MoO3. Films grown at lower pO2 were nonstoichiometric MoOx films with the presence of secondary phase. The microstructure of the grown Mo oxide films is discussed and conditions were optimized to produce phase pure, stoichiometric, and highly textured polycrystalline MoO3 films.

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Pacific Northwest National Laboratory (PNNL), Richland, WA (US), Environmental Molecular Sciences Laboratory (EMSL)
Sponsoring Org.:
USDOE
OSTI Identifier:
918457
Report Number(s):
PNNL-SA-48489
13790; KP1704020
DOE Contract Number:  
AC05-76RL01830
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Surface Science, 253(12):5368-5374
Country of Publication:
United States
Language:
English
Subject:
Environmental Molecular Sciences Laboratory

Citation Formats

Ramana, Chintalapalle V., Atuchin, Victor V., Kesler, V. G., Kochubey, V. A., Pokrovsky, L. D., Shutthanandan, V., Becker, U., and Ewing, Rodney C. Growth and surface characterization of sputter-deposited molybdenum oxide thin films. United States: N. p., 2007. Web. doi:10.1016/j.apsusc.2006.12.012.
Ramana, Chintalapalle V., Atuchin, Victor V., Kesler, V. G., Kochubey, V. A., Pokrovsky, L. D., Shutthanandan, V., Becker, U., & Ewing, Rodney C. Growth and surface characterization of sputter-deposited molybdenum oxide thin films. United States. doi:10.1016/j.apsusc.2006.12.012.
Ramana, Chintalapalle V., Atuchin, Victor V., Kesler, V. G., Kochubey, V. A., Pokrovsky, L. D., Shutthanandan, V., Becker, U., and Ewing, Rodney C. Sun . "Growth and surface characterization of sputter-deposited molybdenum oxide thin films". United States. doi:10.1016/j.apsusc.2006.12.012.
@article{osti_918457,
title = {Growth and surface characterization of sputter-deposited molybdenum oxide thin films},
author = {Ramana, Chintalapalle V. and Atuchin, Victor V. and Kesler, V. G. and Kochubey, V. A. and Pokrovsky, L. D. and Shutthanandan, V. and Becker, U. and Ewing, Rodney C.},
abstractNote = {Molybdenum oxide thin films were produced by magnetron sputtering using a molybdenum (Mo) target. The sputtering was performed in a reactive atmosphere of argon-oxygen gas mixture under varying conditions of substrate temperature (Ts) and oxygen partial pressure (pO2). The effect of Ts and pO2 on the growth and microstructure of molybdenum oxide films was examined in detail using reflection high-energy electron diffraction (RHEED), Rutherford backscattering spectrometry (RBS), energy dispersive X-ray spectrometry (EDS), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM) measurements. The analyses indicate that the effect of Ts and pO2 on the microstructure and phase of the grown molybdenum oxide thin films is remarkable. RHEED and RBS results indicate that the films grown at 445 *C under 62.3% O2 pressure were stoichiometric and polycrystalline MoO3. Films grown at lower pO2 were nonstoichiometric MoOx films with the presence of secondary phase. The microstructure of the grown Mo oxide films is discussed and conditions were optimized to produce phase pure, stoichiometric, and highly textured polycrystalline MoO3 films.},
doi = {10.1016/j.apsusc.2006.12.012},
journal = {Applied Surface Science, 253(12):5368-5374},
number = ,
volume = ,
place = {United States},
year = {Sun Apr 15 00:00:00 EDT 2007},
month = {Sun Apr 15 00:00:00 EDT 2007}
}