Surface charge compensation for a highly charged Ion emissionmicroscope
Journal Article
·
· Ultramicroscopy
OSTI ID:918097
A surface charge compensation electron flood gun has been added to the Lawrence Livermore National Laboratory (LLNL) highly charged ion (HCI) emission microscope. HCI surface interaction results in a significant charge residue being left on the surface of insulators and semiconductors. This residual charge causes undesirable aberrations in the microscope images and a reduction of the Time-Of-Flight (TOF) mass resolution when studying the surfaces of insulators and semiconductors. The benefits and problems associated with HCI microscopy and recent results of the electron flood gun enhanced HCI microscope are discussed.
- Research Organization:
- COLLABORATION - LLNL
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 918097
- Report Number(s):
- LBNL-52429; ULTRD6; R&D Project: 43DR01; BnR: 400403909; TRN: US0805239
- Journal Information:
- Ultramicroscopy, Vol. 101, Issue 2-4; Related Information: Journal Publication Date: 11/2004; ISSN 0304-3991
- Country of Publication:
- United States
- Language:
- English
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