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Title: Surface charge compensation for a highly charged Ion emissionmicroscope

Abstract

A surface charge compensation electron flood gun has been added to the Lawrence Livermore National Laboratory (LLNL) highly charged ion (HCI) emission microscope. HCI surface interaction results in a significant charge residue being left on the surface of insulators and semiconductors. This residual charge causes undesirable aberrations in the microscope images and a reduction of the Time-Of-Flight (TOF) mass resolution when studying the surfaces of insulators and semiconductors. The benefits and problems associated with HCI microscopy and recent results of the electron flood gun enhanced HCI microscope are discussed.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
COLLABORATION - LLNL
Sponsoring Org.:
USDOE
OSTI Identifier:
918097
Report Number(s):
LBNL-52429
Journal ID: ISSN 0304-3991; ULTRD6; R&D Project: 43DR01; BnR: 400403909; TRN: US0805239
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Journal Article
Resource Relation:
Journal Name: Ultramicroscopy; Journal Volume: 101; Journal Issue: 2-4; Related Information: Journal Publication Date: 11/2004
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ELECTRONS; FLOODS; ION EMISSION; LAWRENCE LIVERMORE NATIONAL LABORATORY; MASS RESOLUTION; MICROSCOPES; MICROSCOPY; RESIDUES

Citation Formats

McDonald, J.W., Hamza, A.V., Newman, M.W., Holder, J.P., Schneider, D.H.G., and Schenkel, T. Surface charge compensation for a highly charged Ion emissionmicroscope. United States: N. p., 2003. Web.
McDonald, J.W., Hamza, A.V., Newman, M.W., Holder, J.P., Schneider, D.H.G., & Schenkel, T. Surface charge compensation for a highly charged Ion emissionmicroscope. United States.
McDonald, J.W., Hamza, A.V., Newman, M.W., Holder, J.P., Schneider, D.H.G., and Schenkel, T. Tue . "Surface charge compensation for a highly charged Ion emissionmicroscope". United States. https://www.osti.gov/servlets/purl/918097.
@article{osti_918097,
title = {Surface charge compensation for a highly charged Ion emissionmicroscope},
author = {McDonald, J.W. and Hamza, A.V. and Newman, M.W. and Holder, J.P. and Schneider, D.H.G. and Schenkel, T.},
abstractNote = {A surface charge compensation electron flood gun has been added to the Lawrence Livermore National Laboratory (LLNL) highly charged ion (HCI) emission microscope. HCI surface interaction results in a significant charge residue being left on the surface of insulators and semiconductors. This residual charge causes undesirable aberrations in the microscope images and a reduction of the Time-Of-Flight (TOF) mass resolution when studying the surfaces of insulators and semiconductors. The benefits and problems associated with HCI microscopy and recent results of the electron flood gun enhanced HCI microscope are discussed.},
doi = {},
journal = {Ultramicroscopy},
number = 2-4,
volume = 101,
place = {United States},
year = {Tue Apr 01 00:00:00 EST 2003},
month = {Tue Apr 01 00:00:00 EST 2003}
}