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Title: Conformational Rearrangements in Interfacial Region of Polydimethylsiloxane Melt Films

Abstract

Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 Angstroms) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value).

Authors:
; ; ;
Publication Date:
Research Org.:
Brookhaven National Laboratory (BNL) National Synchrotron Light Source
Sponsoring Org.:
Doe - Office Of Science
OSTI Identifier:
914246
Report Number(s):
BNL-78814-2007-JA
Journal ID: ISSN 0032-3861; POLMAG; TRN: US0802838
DOE Contract Number:  
DE-AC02-98CH10886
Resource Type:
Journal Article
Resource Relation:
Journal Name: Polymer; Journal Volume: 47
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; MOLECULAR WEIGHT; REFLECTIVITY; SILICA; SYNCHROTRONS; THICKNESS; THIN FILMS; national synchrotron light source

Citation Formats

Evmenenko,G., Mo, H., Kewalramani, S., and Dutta, P. Conformational Rearrangements in Interfacial Region of Polydimethylsiloxane Melt Films. United States: N. p., 2006. Web. doi:10.1016/j.polymer.2005.12.010.
Evmenenko,G., Mo, H., Kewalramani, S., & Dutta, P. Conformational Rearrangements in Interfacial Region of Polydimethylsiloxane Melt Films. United States. doi:10.1016/j.polymer.2005.12.010.
Evmenenko,G., Mo, H., Kewalramani, S., and Dutta, P. Sun . "Conformational Rearrangements in Interfacial Region of Polydimethylsiloxane Melt Films". United States. doi:10.1016/j.polymer.2005.12.010.
@article{osti_914246,
title = {Conformational Rearrangements in Interfacial Region of Polydimethylsiloxane Melt Films},
author = {Evmenenko,G. and Mo, H. and Kewalramani, S. and Dutta, P.},
abstractNote = {Synchrotron X-ray reflectivity (XRR) confirms the formation of a quasi-immobilized layer in thin films of polydimethylsiloxane (PDMS) melts near silica surfaces. This layer (40-60 Angstroms) has a lower density than the bulk value, and its thickness varies slightly with PDMS molecular weight. Formation of this layer is very rapid for PDMS melts with low molecular weights (below entanglement limit for these molecules) but takes 5-10 h for higher molecular weights (close to and above their entanglement value).},
doi = {10.1016/j.polymer.2005.12.010},
journal = {Polymer},
number = ,
volume = 47,
place = {United States},
year = {Sun Jan 01 00:00:00 EST 2006},
month = {Sun Jan 01 00:00:00 EST 2006}
}