Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS
Abstract
No abstract prepared.
- Authors:
- Publication Date:
- Research Org.:
- Brookhaven National Lab. (BNL), Upton, NY (United States). National Synchrotron Light Source
- Sponsoring Org.:
- Doe - Office Of Science
- OSTI Identifier:
- 913961
- Report Number(s):
- BNL-78529-2007-JA
TRN: US0801433
- DOE Contract Number:
- DE-AC02-98CH10886
- Resource Type:
- Journal Article
- Journal Name:
- Polym. Mater. Sci. Eng.
- Additional Journal Information:
- Journal Volume: 94
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 43 PARTICLE ACCELERATORS; COPOLYMERS; ABSORPTION; FINE STRUCTURE; ELECTRON SPECTROSCOPY; SURFACES; NSLS; national synchrotron light source
Citation Formats
Krishnan, S, Ober, C, Hexemer, A, Kramer, E, and Fischer, D. Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS. United States: N. p., 2006.
Web.
Krishnan, S, Ober, C, Hexemer, A, Kramer, E, & Fischer, D. Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS. United States.
Krishnan, S, Ober, C, Hexemer, A, Kramer, E, and Fischer, D. 2006.
"Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS". United States.
@article{osti_913961,
title = {Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS},
author = {Krishnan, S and Ober, C and Hexemer, A and Kramer, E and Fischer, D},
abstractNote = {No abstract prepared.},
doi = {},
url = {https://www.osti.gov/biblio/913961},
journal = {Polym. Mater. Sci. Eng.},
number = ,
volume = 94,
place = {United States},
year = {Sun Jan 01 00:00:00 EST 2006},
month = {Sun Jan 01 00:00:00 EST 2006}
}
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