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Title: Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS

Abstract

No abstract prepared.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Brookhaven National Laboratory (BNL) National Synchrotron Light Source
Sponsoring Org.:
Doe - Office Of Science
OSTI Identifier:
913961
Report Number(s):
BNL-78529-2007-JA
TRN: US0801433
DOE Contract Number:  
DE-AC02-98CH10886
Resource Type:
Journal Article
Resource Relation:
Journal Name: Polym. Mater. Sci. Eng.; Journal Volume: 94
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; COPOLYMERS; ABSORPTION; FINE STRUCTURE; ELECTRON SPECTROSCOPY; SURFACES; NSLS; national synchrotron light source

Citation Formats

Krishnan,S., Ober, C., Hexemer, A., Kramer, E., and Fischer, D. Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS. United States: N. p., 2006. Web.
Krishnan,S., Ober, C., Hexemer, A., Kramer, E., & Fischer, D. Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS. United States.
Krishnan,S., Ober, C., Hexemer, A., Kramer, E., and Fischer, D. Sun . "Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS". United States. doi:.
@article{osti_913961,
title = {Compositional Depth Profiling of Block Copolymer Surfaces using NEXAFS},
author = {Krishnan,S. and Ober, C. and Hexemer, A. and Kramer, E. and Fischer, D.},
abstractNote = {No abstract prepared.},
doi = {},
journal = {Polym. Mater. Sci. Eng.},
number = ,
volume = 94,
place = {United States},
year = {Sun Jan 01 00:00:00 EST 2006},
month = {Sun Jan 01 00:00:00 EST 2006}
}