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Title: Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage

Abstract

Metal-containing tetrahedral amorphous carbon films wereproduced by dual filtered cathodic vacuum arc plasma sources operatedinsequentially pulsed mode. Negatively pulsed bias was applied to thesubstrate when carbon plasma was generated, whereas it was absentwhen themolybdenum plasma was presented. Film thickness was measured afterdeposition by profilometry. Glass slides with silver padswere used assubstrates for the measurement of the sheet resistance. Themicrostructure and composition of the films were characterizedbyRamanspectroscopy and Rutherford backscattering, respectively. It was foundthat the electrical resistivity decreases with an increaseof the Mocontent, which can be ascribed to an increase of the sp2 content and anincrease of the sp2 cluster size.

Authors:
; ; ; ;
Publication Date:
Research Org.:
COLLABORATION - MaiU./Thailand
OSTI Identifier:
913157
Report Number(s):
LBNL-61581-JArt
R&D Project: Z2PANC; BnR: 600301010; TRN: US200802%%559
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Journal Article
Resource Relation:
Journal Name: Nuclear Instruments and Methods of Physics ResearchB; Journal Volume: 259; Related Information: Journal Publication Date: 2007
Country of Publication:
United States
Language:
English
Subject:
70; 36; BACKSCATTERING; CARBON; DEPOSITION; ELECTRIC CONDUCTIVITY; GLASS; MICROSTRUCTURE; MOLYBDENUM; PLASMA; RAMAN SPECTROSCOPY; SILVER; SUBSTRATES; THICKNESS; cathodic arcs diamond-like carbon films molybdenum

Citation Formats

Pasaja, Nitisak, Sansongsiri, Sakon, Intasiri, Sawate, Vilaithong, Thiraphat, and Anders, Andre. Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage. United States: N. p., 2007. Web.
Pasaja, Nitisak, Sansongsiri, Sakon, Intasiri, Sawate, Vilaithong, Thiraphat, & Anders, Andre. Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage. United States.
Pasaja, Nitisak, Sansongsiri, Sakon, Intasiri, Sawate, Vilaithong, Thiraphat, and Anders, Andre. Wed . "Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage". United States. doi:. https://www.osti.gov/servlets/purl/913157.
@article{osti_913157,
title = {Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage},
author = {Pasaja, Nitisak and Sansongsiri, Sakon and Intasiri, Sawate and Vilaithong, Thiraphat and Anders, Andre},
abstractNote = {Metal-containing tetrahedral amorphous carbon films wereproduced by dual filtered cathodic vacuum arc plasma sources operatedinsequentially pulsed mode. Negatively pulsed bias was applied to thesubstrate when carbon plasma was generated, whereas it was absentwhen themolybdenum plasma was presented. Film thickness was measured afterdeposition by profilometry. Glass slides with silver padswere used assubstrates for the measurement of the sheet resistance. Themicrostructure and composition of the films were characterizedbyRamanspectroscopy and Rutherford backscattering, respectively. It was foundthat the electrical resistivity decreases with an increaseof the Mocontent, which can be ascribed to an increase of the sp2 content and anincrease of the sp2 cluster size.},
doi = {},
journal = {Nuclear Instruments and Methods of Physics ResearchB},
number = ,
volume = 259,
place = {United States},
year = {Wed Jan 24 00:00:00 EST 2007},
month = {Wed Jan 24 00:00:00 EST 2007}
}