Patterning of nanocrystalline diamond films for diamond microstructures useful in MEMS and other devices
Patent
·
OSTI ID:912844
- Downers Grove, IL
- Bremen, DE
- Bolingbrook, IL
- late of Naperville, IL
- Naperville, IL
MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron . The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.
- Research Organization:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-31109-ENG-38
- Assignee:
- The University of Chicago (Chicago, IL)
- Patent Number(s):
- 6,811,612
- Application Number:
- 10/169,879
- OSTI ID:
- 912844
- Country of Publication:
- United States
- Language:
- English
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