Summary of Vadose -- Zone Conceptual Models for Flow and Contaminant Transport and 1999 - 2003 Progress on Resolving Deficiencies in Understanding the Vadose Zone at the INEEL
The thick vadose zone that underlies the Idaho National Engineering and Environmental Laboratory has been recognized both as an avenue through which contaminants disposed at or near the ground surface can migrate to groundwater in the underlying Eastern Snake River Plain aquifer, and as a barrier to the movement of contaminants into the aquifer. Flow and contaminant transport in the vadose zone at the INEEL is complicated by the highly heterogeneous nature of the geologic framework and by the variations in the behavior of different contaminants in the subsurface. The state of knowledge concerning flow and contaminant transport in the vadose zone at and near the INEEL IN 1999 was summarized in Deficiencies in Vadose Zone Understanding at the Idaho National Engineering and Environmental Laboratory (Wood et al., 2000). These authors identified deficiencies in knowledge of flow and contaminant transport processes in the vadose zone, and provided recommendations for additional work that should be conducted to address these deficiencies. In the period since (Wood et al., 2000) was prepared, research has been published that, to some degree, address these deficiencies. This document provides a bibliography of reports, journal articles, and conference proceedings published 1999 through mid-2003 that are relevant to the vadose zone at or near the INEEL and provides a brief description of each work. Publications that address specific deficiencies or recommendations are identified, and pertinent information from selected publications is presented.
- Research Organization:
- Idaho National Lab. (INL), Idaho Falls, ID (United States)
- Sponsoring Organization:
- DOE - NE
- DOE Contract Number:
- DE-AC07-99ID-13727
- OSTI ID:
- 911889
- Report Number(s):
- INEEL/EXT-03-01495; TRN: US200801%%339
- Country of Publication:
- United States
- Language:
- English
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