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Title: Controllable shrinking and shaping of silicon nitride nanopores under electron irradiation

Abstract

Modification of the Si3N4 nanopore was investigated under electron beam (e-beam) irradiation using a scanning electron microscope (SEM) and the results show that all the pores with diameters ranging from 40-200 nm can be shrunk and reshaped. The shrinkage rate increases with the energy deposited in the membrane. By using the selected area scan tool in the SEM, different shapes of Si3N4 nanopores have been fabricated successfully based on localized e-beam-induced joule heat, with characteristic dimension smaller than 10 nm. A novel technique was proposed to shrink and shape the nanopore to a special structure controllably.

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
908735
Report Number(s):
PNNL-SA-54222
Journal ID: ISSN 0003-6951; APPLAB; KC0201020; TRN: US200722%%767
DOE Contract Number:  
AC05-76RL01830
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters, 90(16):Art. No. 163102; Journal Volume: 90; Journal Issue: 16
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; SILICON NITRIDES; NANOSTRUCTURES; PORE STRUCTURE; ELECTRON BEAMS; IRRADIATION; MORPHOLOGICAL CHANGES; SHAPE; silicon nitride; nanopores; electron irradiation

Citation Formats

Zhang, Weiming, Wang, Yugang, Li, Juan, Xue, Jianming, Ji, Hang, Ouyang, Qi, Xu, Jun, and Zhang, Yanwen. Controllable shrinking and shaping of silicon nitride nanopores under electron irradiation. United States: N. p., 2007. Web. doi:10.1063/1.2723680.
Zhang, Weiming, Wang, Yugang, Li, Juan, Xue, Jianming, Ji, Hang, Ouyang, Qi, Xu, Jun, & Zhang, Yanwen. Controllable shrinking and shaping of silicon nitride nanopores under electron irradiation. United States. doi:10.1063/1.2723680.
Zhang, Weiming, Wang, Yugang, Li, Juan, Xue, Jianming, Ji, Hang, Ouyang, Qi, Xu, Jun, and Zhang, Yanwen. Mon . "Controllable shrinking and shaping of silicon nitride nanopores under electron irradiation". United States. doi:10.1063/1.2723680.
@article{osti_908735,
title = {Controllable shrinking and shaping of silicon nitride nanopores under electron irradiation},
author = {Zhang, Weiming and Wang, Yugang and Li, Juan and Xue, Jianming and Ji, Hang and Ouyang, Qi and Xu, Jun and Zhang, Yanwen},
abstractNote = {Modification of the Si3N4 nanopore was investigated under electron beam (e-beam) irradiation using a scanning electron microscope (SEM) and the results show that all the pores with diameters ranging from 40-200 nm can be shrunk and reshaped. The shrinkage rate increases with the energy deposited in the membrane. By using the selected area scan tool in the SEM, different shapes of Si3N4 nanopores have been fabricated successfully based on localized e-beam-induced joule heat, with characteristic dimension smaller than 10 nm. A novel technique was proposed to shrink and shape the nanopore to a special structure controllably.},
doi = {10.1063/1.2723680},
journal = {Applied Physics Letters, 90(16):Art. No. 163102},
number = 16,
volume = 90,
place = {United States},
year = {Mon Apr 16 00:00:00 EDT 2007},
month = {Mon Apr 16 00:00:00 EDT 2007}
}