System for generating twodimensional masks from a threedimensional model using topological analysis
Abstract
A method of generating twodimensional masks from a threedimensional model comprises providing a threedimensional model representing a microelectromechanical structure for manufacture and a description of process mask requirements, reducing the threedimensional model to a topological description of unique cross sections, and selecting candidate masks from the unique cross sections and the cross section topology. The method further can comprise reconciling the candidate masks based on the process mask requirements description to produce twodimensional process masks.
 Inventors:

 Albuquerque, NM
 Publication Date:
 Research Org.:
 Sandia National Lab. (SNLNM), Albuquerque, NM (United States)
 Sponsoring Org.:
 USDOE
 OSTI Identifier:
 908352
 Patent Number(s):
 7,065,736
 Assignee:
 Sandia Corporation (Albuquerque, NM)
 DOE Contract Number:
 DEAC0494AL85000
 Resource Type:
 Patent
 Country of Publication:
 United States
 Language:
 English
 Subject:
 97 MATHEMATICS AND COMPUTING
Citation Formats
Schiek, Richard. System for generating twodimensional masks from a threedimensional model using topological analysis. United States: N. p., 2006.
Web.
Schiek, Richard. System for generating twodimensional masks from a threedimensional model using topological analysis. United States.
Schiek, Richard. Tue .
"System for generating twodimensional masks from a threedimensional model using topological analysis". United States. https://www.osti.gov/servlets/purl/908352.
@article{osti_908352,
title = {System for generating twodimensional masks from a threedimensional model using topological analysis},
author = {Schiek, Richard},
abstractNote = {A method of generating twodimensional masks from a threedimensional model comprises providing a threedimensional model representing a microelectromechanical structure for manufacture and a description of process mask requirements, reducing the threedimensional model to a topological description of unique cross sections, and selecting candidate masks from the unique cross sections and the cross section topology. The method further can comprise reconciling the candidate masks based on the process mask requirements description to produce twodimensional process masks.},
doi = {},
url = {https://www.osti.gov/biblio/908352},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2006},
month = {6}
}
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Works referenced in this record:
Development of a geometrybased process planning system for surface micromachining
journal, January 2002
 Cho, Sungwook; Lee, Kunwoo; Kim, TaeWan
 International Journal of Production Research, Vol. 40, Issue 5