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Title: System for generating two-dimensional masks from a three-dimensional model using topological analysis

Abstract

A method of generating two-dimensional masks from a three-dimensional model comprises providing a three-dimensional model representing a micro-electro-mechanical structure for manufacture and a description of process mask requirements, reducing the three-dimensional model to a topological description of unique cross sections, and selecting candidate masks from the unique cross sections and the cross section topology. The method further can comprise reconciling the candidate masks based on the process mask requirements description to produce two-dimensional process masks.

Inventors:
 [1]
  1. Albuquerque, NM
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
908352
Patent Number(s):
7,065,736
Assignee:
Sandia Corporation (Albuquerque, NM)
DOE Contract Number:  
DE-AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
97 MATHEMATICS AND COMPUTING

Citation Formats

Schiek, Richard. System for generating two-dimensional masks from a three-dimensional model using topological analysis. United States: N. p., 2006. Web.
Schiek, Richard. System for generating two-dimensional masks from a three-dimensional model using topological analysis. United States.
Schiek, Richard. Tue . "System for generating two-dimensional masks from a three-dimensional model using topological analysis". United States. https://www.osti.gov/servlets/purl/908352.
@article{osti_908352,
title = {System for generating two-dimensional masks from a three-dimensional model using topological analysis},
author = {Schiek, Richard},
abstractNote = {A method of generating two-dimensional masks from a three-dimensional model comprises providing a three-dimensional model representing a micro-electro-mechanical structure for manufacture and a description of process mask requirements, reducing the three-dimensional model to a topological description of unique cross sections, and selecting candidate masks from the unique cross sections and the cross section topology. The method further can comprise reconciling the candidate masks based on the process mask requirements description to produce two-dimensional process masks.},
doi = {},
url = {https://www.osti.gov/biblio/908352}, journal = {},
number = ,
volume = ,
place = {United States},
year = {2006},
month = {6}
}

Patent:

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Works referenced in this record:

Development of a geometry-based process planning system for surface micromachining
journal, January 2002