Method for generating extreme ultraviolet with mather-type plasma accelerators for use in Extreme Ultraviolet Lithography

Patent · Tue Oct 03 00:00:00 EDT 2006

OSTI ID:908247

Hassanein, Ahmed ^[1]; Konkashbaev, Isak ^[1]

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1. Bolingbrook, IL

A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma accelerators can utilize tin, or lithium covered electrodes. Tin, lithium or xenon can be used as the photon emitting gas source.

• Research Organization: Argonne National Laboratory (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: W-31109-ENG-38
• Assignee: The United States of America as represented by the United States Department of Energy (Washington, DC)
• Patent Number(s): 7,115,887
• Application Number: 11/079,238
• OSTI ID: 908247
• Country of Publication: United States
• Language: English