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Title: Reticle stage based linear dosimeter

Abstract

A detector to measure EUV intensity employs a linear array of photodiodes. The detector is particularly suited for photolithography systems that includes: (i) a ringfield camera; (ii) a source of radiation; (iii) a condenser for processing radiation from the source of radiation to produce a ringfield illumination field for illuminating a mask; (iv) a reticle that is positioned at the ringfield camera's object plane and from which a reticle image in the form of an intensity profile is reflected into the entrance pupil of the ringfield camera, wherein the reticle moves in a direction that is transverse to the length of the ringfield illumination field that illuminates the reticle; (v) detector for measuring the entire intensity along the length of the ringfield illumination field that is projected onto the reticle; and (vi) a wafer onto which the reticle imaged is projected from the ringfield camera.

Inventors:
 [1]
  1. Livermore, CA
Publication Date:
Research Org.:
Sandia National Laboratories (SNL-CA), Livermore, CA
Sponsoring Org.:
USDOE
OSTI Identifier:
907949
Patent Number(s):
7,196,771
Application Number:
11/087,996
Assignee:
EUV LLC (Santa Clara, CA) SNL-L
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
61 RADIATION PROTECTION AND DOSIMETRY

Citation Formats

Berger, Kurt W. Reticle stage based linear dosimeter. United States: N. p., 2007. Web.
Berger, Kurt W. Reticle stage based linear dosimeter. United States.
Berger, Kurt W. Tue . "Reticle stage based linear dosimeter". United States. doi:. https://www.osti.gov/servlets/purl/907949.
@article{osti_907949,
title = {Reticle stage based linear dosimeter},
author = {Berger, Kurt W},
abstractNote = {A detector to measure EUV intensity employs a linear array of photodiodes. The detector is particularly suited for photolithography systems that includes: (i) a ringfield camera; (ii) a source of radiation; (iii) a condenser for processing radiation from the source of radiation to produce a ringfield illumination field for illuminating a mask; (iv) a reticle that is positioned at the ringfield camera's object plane and from which a reticle image in the form of an intensity profile is reflected into the entrance pupil of the ringfield camera, wherein the reticle moves in a direction that is transverse to the length of the ringfield illumination field that illuminates the reticle; (v) detector for measuring the entire intensity along the length of the ringfield illumination field that is projected onto the reticle; and (vi) a wafer onto which the reticle imaged is projected from the ringfield camera.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 27 00:00:00 EDT 2007},
month = {Tue Mar 27 00:00:00 EDT 2007}
}

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