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Title: New nanofabrication technique using overlay for 15-nm zoneplate

Abstract

No abstract prepared.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
Sponsoring Org.:
USDOE Director. Office of Science. Office of Basic EnergySciences; Natonal Science Foundation. Engineering Research CentreProgram, US Department of Defense. Defense Advanced Research ProjectsAgency
OSTI Identifier:
907914
Report Number(s):
LBNL-61036
R&D Project: 509201; BnR: KC0202030; TRN: US200721%%328
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Journal Article
Resource Relation:
Journal Name: SPIE- International Society for OpticalEngineering; Journal Volume: 6110; Related Information: Journal Publication Date: 2006
Country of Publication:
United States
Language:
English
Subject:
36; PLATES; FABRICATION; NANOSTRUCTURES

Citation Formats

Chao, Weilun, Harteneck, Bruce D., Anderson, Erik H., Attwood,David, and Liddle, J. Alexander. New nanofabrication technique using overlay for 15-nm zoneplate. United States: N. p., 2005. Web.
Chao, Weilun, Harteneck, Bruce D., Anderson, Erik H., Attwood,David, & Liddle, J. Alexander. New nanofabrication technique using overlay for 15-nm zoneplate. United States.
Chao, Weilun, Harteneck, Bruce D., Anderson, Erik H., Attwood,David, and Liddle, J. Alexander. Wed . "New nanofabrication technique using overlay for 15-nm zoneplate". United States.
@article{osti_907914,
title = {New nanofabrication technique using overlay for 15-nm zoneplate},
author = {Chao, Weilun and Harteneck, Bruce D. and Anderson, Erik H. and Attwood,David and Liddle, J. Alexander},
abstractNote = {No abstract prepared.},
doi = {},
journal = {SPIE- International Society for OpticalEngineering},
number = ,
volume = 6110,
place = {United States},
year = {Wed May 18 00:00:00 EDT 2005},
month = {Wed May 18 00:00:00 EDT 2005}
}