Extreme ultraviolet microexposures at the Advanced Light Sourceusing the 0.3 numerical aperture micro-exposure tool optic
Journal Article
·
· The Journal of Vacuum Science and Technology B
No abstract prepared.
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Director. Office of Science. Office of Basic EnergySciences
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 903495
- Report Number(s):
- LBNL-60975; R&D Project: 509201; BnR: KC0202030; TRN: US0703275
- Journal Information:
- The Journal of Vacuum Science and Technology B, Vol. 22, Issue 6; Related Information: Journal Publication Date: Nov./Dec.2004
- Country of Publication:
- United States
- Language:
- English
Similar Records
Sub-diffraction-limited multilayer coatings for the 0.3 numerical aperture micro-exposure tool for extreme ultraviolet lithography
Sub-diffraction-limited multilayer coatings for the 0.3 numericalaperture micro-exposure tool for extreme ultraviolet lithograpy
Lithographic characterization of the field dependent astigmatismand alignment stability of a 0.3 numerical aperture extreme ultravioletmicrofield optic
Journal Article
·
Wed Jun 20 00:00:00 EDT 2007
· Applied Optics
·
OSTI ID:903495
+6 more
Sub-diffraction-limited multilayer coatings for the 0.3 numericalaperture micro-exposure tool for extreme ultraviolet lithograpy
Journal Article
·
Wed Nov 01 00:00:00 EST 2006
· Applied Optics
·
OSTI ID:903495
+6 more
Lithographic characterization of the field dependent astigmatismand alignment stability of a 0.3 numerical aperture extreme ultravioletmicrofield optic
Journal Article
·
Thu Sep 01 00:00:00 EDT 2005
· The Journal of Vacuum Science and Technology B
·
OSTI ID:903495