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Title: Method for plasma formation for extreme ultraviolet lithography-theta pinch

Abstract

A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.

Inventors:
 [1];  [2];  [3]
  1. Naperville, IL
  2. Bolingbrook, IL
  3. Hillsboro, OR
Publication Date:
Research Org.:
Argonne National Laboratory (ANL), Argonne, IL; Univ. of Chicago, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
902704
Patent Number(s):
7,180,082
Application Number:
11/066,655
Assignee:
The United States of America as represented by the United States Department of Energy (Washington, DC) ANL
DOE Contract Number:
W-31-109-ENG-38
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Hassanein, Ahmed, Konkashbaev, Isak, and Rice, Bryan. Method for plasma formation for extreme ultraviolet lithography-theta pinch. United States: N. p., 2007. Web.
Hassanein, Ahmed, Konkashbaev, Isak, & Rice, Bryan. Method for plasma formation for extreme ultraviolet lithography-theta pinch. United States.
Hassanein, Ahmed, Konkashbaev, Isak, and Rice, Bryan. Tue . "Method for plasma formation for extreme ultraviolet lithography-theta pinch". United States. doi:. https://www.osti.gov/servlets/purl/902704.
@article{osti_902704,
title = {Method for plasma formation for extreme ultraviolet lithography-theta pinch},
author = {Hassanein, Ahmed and Konkashbaev, Isak and Rice, Bryan},
abstractNote = {A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating gas, thereby producing a electromagnetic wave in the extreme ultraviolet range; a collecting means in optical communication with the pinch chamber to collect the electromagnetic radiation; and focusing means in optical communication with the collecting means to concentrate the electromagnetic radiation.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 20 00:00:00 EST 2007},
month = {Tue Feb 20 00:00:00 EST 2007}
}

Patent:

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