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Title: Ultra-high accuracy optical testing: creating diffraction-limitedshort-wavelength optical systems

Abstract

Since 1993, research in the fabrication of extreme ultraviolet (EUV) optical imaging systems, conducted at Lawrence Berkeley National Laboratory (LBNL) and Lawrence Livermore National Laboratory (LLNL), has produced the highest resolution optical systems ever made. We have pioneered the development of ultra-high-accuracy optical testing and alignment methods, working at extreme ultraviolet wavelengths, and pushing wavefront-measuring interferometry into the 2-20-nm wavelength range (60-600 eV). These coherent measurement techniques, including lateral shearing interferometry and phase-shifting point-diffraction interferometry (PS/PDI) have achieved RMS wavefront measurement accuracies of 0.5-1-{angstrom} and better for primary aberration terms, enabling the creation of diffraction-limited EUV optics. The measurement accuracy is established using careful null-testing procedures, and has been verified repeatedly through high-resolution imaging. We believe these methods are broadly applicable to the advancement of short-wavelength optical systems including space telescopes, microscope objectives, projection lenses, synchrotron beamline optics, diffractive and holographic optics, and more. Measurements have been performed on a tunable undulator beamline at LBNL's Advanced Light Source (ALS), optimized for high coherent flux; although many of these techniques should be adaptable to alternative ultraviolet, EUV, and soft x-ray light sources. To date, we have measured nine prototype all-reflective EUV optical systems with NA values between 0.08 and 0.30 (f/6.25more » to f/1.67). These projection-imaging lenses were created for the semiconductor industry's advanced research in EUV photolithography, a technology slated for introduction in 2009-13. This paper reviews the methods used and our program's accomplishments to date.« less

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Ernest Orlando Lawrence Berkeley NationalLaboratory, Berkeley, CA (US)
Sponsoring Org.:
USDOE, Lawrence Livermore National Laboratory; InternationalSEMATECH
OSTI Identifier:
901034
Report Number(s):
LBNL-60541
R&D Project: M30007; BnR: 600303000; TRN: US0702436
DOE Contract Number:  
DE-AC02-05CH11231
Resource Type:
Conference
Resource Relation:
Conference: The International Society for Optical Engineering(SPIE), San Diego, CA, August 3, 2005
Country of Publication:
United States
Language:
English
Subject:
36; ACCURACY; ADVANCED LIGHT SOURCE; ALIGNMENT; FABRICATION; INTERFEROMETRY; LENSES; LIGHT SOURCES; MICROSCOPES; OPTICAL SYSTEMS; OPTICS; RESOLUTION; SYNCHROTRONS; TELESCOPES; TESTING; WAVELENGTHS; WIGGLER MAGNETS

Citation Formats

Goldberg, Kenneth A., Naulleau, Patrick P., Rekawa, Senajith B., Denham, Paul E., Liddle, J. Alexander, Gullikson, Eric M., Jackson, KeithH., Anderson, Erik H., Taylor, John S., Sommargren, Gary E., Chapman,Henry N., Phillion, Donald W., Johnson, Michael, Barty, Anton, Soufli,Regina, Spiller, Eberhard A., Walton, Christopher C., and Bajt, Sasa. Ultra-high accuracy optical testing: creating diffraction-limitedshort-wavelength optical systems. United States: N. p., 2005. Web.
Goldberg, Kenneth A., Naulleau, Patrick P., Rekawa, Senajith B., Denham, Paul E., Liddle, J. Alexander, Gullikson, Eric M., Jackson, KeithH., Anderson, Erik H., Taylor, John S., Sommargren, Gary E., Chapman,Henry N., Phillion, Donald W., Johnson, Michael, Barty, Anton, Soufli,Regina, Spiller, Eberhard A., Walton, Christopher C., & Bajt, Sasa. Ultra-high accuracy optical testing: creating diffraction-limitedshort-wavelength optical systems. United States.
Goldberg, Kenneth A., Naulleau, Patrick P., Rekawa, Senajith B., Denham, Paul E., Liddle, J. Alexander, Gullikson, Eric M., Jackson, KeithH., Anderson, Erik H., Taylor, John S., Sommargren, Gary E., Chapman,Henry N., Phillion, Donald W., Johnson, Michael, Barty, Anton, Soufli,Regina, Spiller, Eberhard A., Walton, Christopher C., and Bajt, Sasa. Wed . "Ultra-high accuracy optical testing: creating diffraction-limitedshort-wavelength optical systems". United States. doi:. https://www.osti.gov/servlets/purl/901034.
@article{osti_901034,
title = {Ultra-high accuracy optical testing: creating diffraction-limitedshort-wavelength optical systems},
author = {Goldberg, Kenneth A. and Naulleau, Patrick P. and Rekawa, Senajith B. and Denham, Paul E. and Liddle, J. Alexander and Gullikson, Eric M. and Jackson, KeithH. and Anderson, Erik H. and Taylor, John S. and Sommargren, Gary E. and Chapman,Henry N. and Phillion, Donald W. and Johnson, Michael and Barty, Anton and Soufli,Regina and Spiller, Eberhard A. and Walton, Christopher C. and Bajt, Sasa},
abstractNote = {Since 1993, research in the fabrication of extreme ultraviolet (EUV) optical imaging systems, conducted at Lawrence Berkeley National Laboratory (LBNL) and Lawrence Livermore National Laboratory (LLNL), has produced the highest resolution optical systems ever made. We have pioneered the development of ultra-high-accuracy optical testing and alignment methods, working at extreme ultraviolet wavelengths, and pushing wavefront-measuring interferometry into the 2-20-nm wavelength range (60-600 eV). These coherent measurement techniques, including lateral shearing interferometry and phase-shifting point-diffraction interferometry (PS/PDI) have achieved RMS wavefront measurement accuracies of 0.5-1-{angstrom} and better for primary aberration terms, enabling the creation of diffraction-limited EUV optics. The measurement accuracy is established using careful null-testing procedures, and has been verified repeatedly through high-resolution imaging. We believe these methods are broadly applicable to the advancement of short-wavelength optical systems including space telescopes, microscope objectives, projection lenses, synchrotron beamline optics, diffractive and holographic optics, and more. Measurements have been performed on a tunable undulator beamline at LBNL's Advanced Light Source (ALS), optimized for high coherent flux; although many of these techniques should be adaptable to alternative ultraviolet, EUV, and soft x-ray light sources. To date, we have measured nine prototype all-reflective EUV optical systems with NA values between 0.08 and 0.30 (f/6.25 to f/1.67). These projection-imaging lenses were created for the semiconductor industry's advanced research in EUV photolithography, a technology slated for introduction in 2009-13. This paper reviews the methods used and our program's accomplishments to date.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Wed Aug 03 00:00:00 EDT 2005},
month = {Wed Aug 03 00:00:00 EDT 2005}
}

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