Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage
Metal-containing tetrahedral amorphous carbon films were produced by dual filtered cathodic vacuum arc (FCVA) plasma sources operated in sequential pulsed mode. A negatively pulsed bias was applied to the substrate only when carbon plasma was generated. Films thickness was measured after deposition by profilometry. Glass slides with silver pads were used as substrate for the of the measurement sheet resistance. The microstructure and composition of the films were characterized by Raman spectroscopy and Rutherford backscattering, respectively. It found that the electrical resistivity decreases with an increase of the Mo content, which can be ascribed to an increase of sp2 content and an increase of the sp2 cluster size.
- Research Organization:
- COLLABORATION - Department of Physics, Facultyof Science, Chiang Mai University
- DOE Contract Number:
- DE-AC02-05CH11231
- OSTI ID:
- 893616
- Report Number(s):
- LBNL-61581; R&D Project: Z2PANC; TRN: US200625%%434
- Resource Relation:
- Conference: International Conference on Ion Beam Modifactionof Materials - IBMM 2006, Taormina, Italy, 18-22 Sept.2006
- Country of Publication:
- United States
- Language:
- English
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