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Title: Three-Dimensional Metallic Photonic Crystals Fabricated by Soft lithography for Midinfrared Applications

Abstract

No abstract prepared.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Ames Laboratory (AMES), Ames, IA
Sponsoring Org.:
USDOE Office of Science and Technology (OST) - (EM-50)
OSTI Identifier:
886739
Report Number(s):
IS-J 7066
Journal ID: ISSN 0003-6951; APPLAB; TRN: US0604012
DOE Contract Number:
W-7405-Eng-82
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 88; Journal Issue: 18
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CRYSTALS; PHYSICS; AMES LABORATORY

Citation Formats

J.H.Lee, C.H. Kim, Y.S. Kim, K.M. Ho, K. Constant, and C.H. Oh. Three-Dimensional Metallic Photonic Crystals Fabricated by Soft lithography for Midinfrared Applications. United States: N. p., 2006. Web.
J.H.Lee, C.H. Kim, Y.S. Kim, K.M. Ho, K. Constant, & C.H. Oh. Three-Dimensional Metallic Photonic Crystals Fabricated by Soft lithography for Midinfrared Applications. United States.
J.H.Lee, C.H. Kim, Y.S. Kim, K.M. Ho, K. Constant, and C.H. Oh. Wed . "Three-Dimensional Metallic Photonic Crystals Fabricated by Soft lithography for Midinfrared Applications". United States. doi:.
@article{osti_886739,
title = {Three-Dimensional Metallic Photonic Crystals Fabricated by Soft lithography for Midinfrared Applications},
author = {J.H.Lee and C.H. Kim and Y.S. Kim and K.M. Ho and K. Constant and C.H. Oh},
abstractNote = {No abstract prepared.},
doi = {},
journal = {Applied Physics Letters},
number = 18,
volume = 88,
place = {United States},
year = {Wed May 03 00:00:00 EDT 2006},
month = {Wed May 03 00:00:00 EDT 2006}
}
  • We present an efficient method of fabricating freestanding three-dimensional metallic photonic crystals using soft lithography. Low cost and ease of fabrication are achieved through gold sputter deposition on a freestanding woodpile polymer template. We compare experimental results to theoretical calculations for tetragonal and face-centered-tetragonal structures as a function of the number of layers. The photonic crystals behave like full metallic structures with a photonic band edge at a wavelength of 3.5 {mu}m. The rejection rates of the structures are about 10 dB/layer.
  • We describe the fabrication of silicon three dimensional photonic crystals using polymer templates defined by a single step, two-photon exposure through a layer of photopolymer with relief molded on its surface. The resulting crystals exhibit high structural quality over large areas, displaying geometries consistent with calculation. Spectroscopic measurements of transmission and reflection through the silicon and polymer structures reveal excellent optical properties, approaching properties predicted by simulations that assume ideal layouts.
  • The authors describe the fabrication and characterization of three dimensional silicon inverse woodpile photonic crystals. A dual exposure, two-photon, conformal phasemask technique is used to create high quality polymer woodpile structures over large areas with geometries that quantitatively match expectations based on optical simulations. Depositing silicon into these templates followed by the removal of the polymer results in silicon inverse woodpile photonic crystals for which calculations indicate a wide, complete photonic bandgap over a range of structural fill fractions. Spectroscopic measurements of normal incidence reflection from both the polymer and siliconphotonic crystals reveal good optical properties.