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Title: A critical implanted CI concentration for pit initiation on aluminum thin films.

Abstract

No abstract prepared.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Sandia National Laboratories
Sponsoring Org.:
USDOE
OSTI Identifier:
886645
Report Number(s):
SAND2005-7774J
TRN: US200616%%1038
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Journal Article
Resource Relation:
Journal Name: Proposed for publication in the Journal of the Electrochemical Society.
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM; THIN FILMS; ION IMPLANTATION; PITTING CORROSION; NUCLEATION

Citation Formats

Zavadil, Kevin Robert, Wall, Frederick Douglas, Barbour, John Charles, Johnson, Craig Mackenzie, and Serna, Lysle M. A critical implanted CI concentration for pit initiation on aluminum thin films.. United States: N. p., 2005. Web.
Zavadil, Kevin Robert, Wall, Frederick Douglas, Barbour, John Charles, Johnson, Craig Mackenzie, & Serna, Lysle M. A critical implanted CI concentration for pit initiation on aluminum thin films.. United States.
Zavadil, Kevin Robert, Wall, Frederick Douglas, Barbour, John Charles, Johnson, Craig Mackenzie, and Serna, Lysle M. Thu . "A critical implanted CI concentration for pit initiation on aluminum thin films.". United States. doi:.
@article{osti_886645,
title = {A critical implanted CI concentration for pit initiation on aluminum thin films.},
author = {Zavadil, Kevin Robert and Wall, Frederick Douglas and Barbour, John Charles and Johnson, Craig Mackenzie and Serna, Lysle M.},
abstractNote = {No abstract prepared.},
doi = {},
journal = {Proposed for publication in the Journal of the Electrochemical Society.},
number = ,
volume = ,
place = {United States},
year = {Thu Dec 01 00:00:00 EST 2005},
month = {Thu Dec 01 00:00:00 EST 2005}
}